Hardanger machine embroidery and method
    1.
    发明申请
    Hardanger machine embroidery and method 失效
    Hardanger机绣及方法

    公开(公告)号:US20050229831A1

    公开(公告)日:2005-10-20

    申请号:US11079577

    申请日:2005-03-14

    申请人: Laura Waterfield

    发明人: Laura Waterfield

    IPC分类号: D05C3/00 D05C7/00 D05C7/10

    CPC分类号: D05C7/00 D05C7/10

    摘要: Hardanger embroidery designs, which can be performed by a sewing machine, preferably a computerized machine with digitized design embroidery patterns. The method employs a layer of fabric 11 and a layer of removable stabilizer 12. A wingneedle stitches square eyelet patterns reminiscent of hand-sewn hardanger. Sets of concentric underlay stitch lines 15 bind fabric 11 and removable stabilizer 12 about cutwork sections 16 before removing fabric from said cutwork sections. Sets of intersecting underlay stitch lines 18 replace bar threads in cutwork sections. Each set of intersecting underlay stitch lines 18 is anchored to sets of concentric underlay stitch lines 15 and associated fabric 11. Lace fill stitches 19 stitch onto removable stabilizer 12 in conjunction with intersecting underlay stitch lines. Lace fill stitches are anchored to either intersecting or concentric underlay stitch lines. Both concentric and underlay stitch lines are sewn in sets of at least two separate stitch lines in which each set of stitch lines are approximately parallel. The normal, cross-sectional distance across any set of underlay stitch lines is nearly as long as associated finishing stitches width. Finishing stitches 20 sew normal to, or otherwise cover, all sets of underlay stitch lines and associated cut fabric edges. Finishing stitch widths uniformly and sufficiently cover underlay stitch lines and fabric edges. Underlay stitch patterns 22 sew before and beneath hardanger motifs to locally bind fabric and removable stabilizer. Underlay stitch patterns permit scaling of hardanger motifs independent of fabric choice and emboss said hardanger motifs. Once a hardanger embroidery design is completed, removable stabilizer 12 is removed, leaving a hardanger embroidery design stitched to fabric.

    摘要翻译: Hardanger刺绣设计,可以由缝纫机进行,最好是具有数字化设计刺绣图案的计算机化机器。 该方法采用一层织物11和一层可移除的稳定剂12。 一个翼针缝合方形的孔眼图案,让人联想到手工缝制的硬化剂。 在从所述切割部分去除织物之前,同心的下划线15的组合将织物11和可移除的稳定器12围绕切割部分16粘结。 相交的底线针迹组18代替切割部分中的条形线。 每组相交的衬垫线迹18被锚定到同心的下划线15和相关的织物11的组。 花边填充针迹19与相交的底线缝合线连接到可移动的稳定器12上。 花边填充针脚被锚定到相交或同心的下划线。 同心针迹线和衬垫针迹线均缝合有至少两根分开的针迹线,其中每组缝合线近似平行。 穿过任何一组衬垫线迹的正常横截面距离与相关的整理针迹宽度几乎相同。 整理针迹20正常缝合或以其他方式覆盖所有套底线和相关的切割织物边缘。 整理针迹宽度均匀并充分覆盖底线和织物边缘。 在绣花图案之前和之下缝制的衬垫针迹图案22以局部地粘合织物和可移除的稳定剂。 衬垫针迹图案允许与织物选择无关的硬化剂图案的缩放,并且压印所述硬化剂图案。 一旦硬化刺绣设计完成,去除可移动的稳定器12,留下硬化刺绣设计缝合到织物上。

    Translucent applique cutwork machine embroidery and method
    2.
    发明申请
    Translucent applique cutwork machine embroidery and method 审中-公开
    半透明贴花切割机绣花及方法

    公开(公告)号:US20050211147A1

    公开(公告)日:2005-09-29

    申请号:US11088190

    申请日:2005-03-23

    申请人: Laura Waterfield

    发明人: Laura Waterfield

    IPC分类号: D05B3/00 D05C17/00

    CPC分类号: D05C17/00

    摘要: Translucent applique cutwork embroidery designs can be performed by a sewing machine, preferably a computerized machine with digitized design embroidery patterns. The method employs a foundation fabric 11 and a removable stabilizer 12. Once a cutwork section 14 in an applique cutwork embroidery design is defined with a set of concentric underlay stitches 13 that bind said foundation fabric to removable stabilizer, said foundation fabric is removed from said cutwork section. An applique fabric 16 is then stitched in place over the cutwork section with another set of concentric underlay stitches 13 that are sewn in approximately the same location as the first set of concentric underlay stitches. Excess applique fabric 16 is cut away. The applique cutwork seam 18 joining applique fabric to foundation fabric is finished with zigzag stitches 17 that overcast all said concentric underlay stitches. Where appropriate, a machine embroidery design 19 is stitched on top of said applique fabric, cascading onto said foundation fabric. Said applique cutwork seam is concealed with satin stitches, or similar concealing stitches 20. The balance of the embroidery design is stitched onto said foundation fabric. When said removable stabilizer is removed, no further trimming of fabrics or threads is required.

    摘要翻译: 半透明贴花刺绣刺绣设计可以由缝纫机进行,最好是具有数字化设计刺绣图案的计算机化机器。 该方法采用基础织物11和可移除的稳定器12。 一旦用贴花刺绣刺绣设计的切割部分14限定了一组将所述基底织物结合到可移除的稳定器的同心底层缝合线13,则所述基底织物从所述切割部分移除。 然后将贴布织物16缝合在切割部分上的适当位置,并具有与第一组同心底层缝合线大致相同的位置缝合的另一组同心衬底缝合线13。 多余的贴布织物16被切掉。 将贴布织物连接到基底织物上的贴花切割缝18完成了锯齿形针迹17,其遮蔽所有所述同心的底层针迹。 在适当的地方,将机器刺绣设计19缝合在所述贴布织物的顶部上,级联到所述基底织物上。 所述贴花切割缝被缎纹针迹或类似的隐藏针迹20隐藏。 刺绣设计的平衡被缝合到所述基础织物上。 当去除所述可去除的稳定剂时,不需要进一步修整织物或丝线。