X-RAY SOURCE APPARATUS AND CONTROL METHOD THEREOF

    公开(公告)号:US20190306963A1

    公开(公告)日:2019-10-03

    申请号:US16371396

    申请日:2019-04-01

    IPC分类号: H05G1/02 H05G1/34 H01J35/06

    摘要: The present disclosure relates to an X-ray source apparatus and a control method of the X-ray source apparatus in which a cathode electrode and a gate electrode are arranged in an array form to enable matrix control, and, thus, it is possible to irradiate X-rays at an optimum dose for each position on the subject. Therefore, it is possible to suppress the irradiation of more X-rays than are needed to the subject. Also, it is possible to obtain a high-resolution and high-quality X-ray image. As such, two-dimensional matrix control makes it easy to control the dose of X-rays and makes it possible to uniformly irradiate X-rays to the subject. Therefore, it is possible to manufacture a high-resolution surface X-ray source with less dependence on the size of the focus of electron beams.