公开(公告)号：US20040159786A1

公开(公告)日：2004-08-19

申请号：US10777941

申请日：2004-02-12

Applicant: Korea Advanced Institute of Science and Technology

Inventor： Il-Joo Cho ,  Eun-Chul Park ,  Songcheol Hong ,  Euisik Yoon

IPC: G21K007/00 ,  G01N023/00

CPC classification number: G01Q70/16 ,  G01N23/225

Abstract: A probe is provided for an SPM (Scanning Probe Microscope), and a method is provided for fabricating the probe in which a double side alignment process is not required to simplify the fabricating. The probe includes a cantilever; a body supporting the cantilever; and a tip formed at an end of the cantilever, wherein the cantilever, the body and the tip are made of silicon, and boron is diffused into the cantilever and a predetermined area of the body. The method includes steps of: forming a first mask layer on an area of a silicon substrate to be formed with the body and the tip; etching the silicon substrate in a predetermined depth using the first mask layer to form the tip; removing the first mask and forming a second mask layer on an area of the silicon substrate except for an area to be formed with the body and the cantilever; forming a boron-diffused layer by diffusing boron into an area to be formed with the cantilever and a predetermined area of the body using the second mask; removing the second mask layer and forming a third mask layer on the boron-diffused layer; and etching the silicon substrate using the third mask layer to form the body and the cantilever.

Abstract translation: 提供了用于SPM（扫描探针显微镜）的探针，并且提供了一种用于制造探针的方法，其中不需要双侧对准工艺来简化制造。 探头包括悬臂; 支撑悬臂的身体; 以及形成在所述悬臂的端部的尖端，其中所述悬臂，所述主体和所述尖端由硅制成，并且硼扩散到所述悬臂和所述主体的预定区域。 该方法包括以下步骤：在要与主体和尖端形成的硅衬底的区域上形成第一掩模层; 使用第一掩模层以预定深度蚀刻硅衬底以形成尖端; 除去所述第一掩模并在所述硅衬底的除了要与所述主体和所述悬臂形成的区域之外的区域上形成第二掩模层; 通过使用第二掩模将硼扩散到与悬臂形成的区域和身体的预定区域中，形成硼扩散层; 去除所述第二掩模层并在所述硼扩散层上形成第三掩模层; 以及使用所述第三掩模层蚀刻所述硅衬底以形成所述主体和所述悬臂。