公开(公告)号：US20240097077A1

公开(公告)日：2024-03-21

申请号：US18470217

申请日：2023-09-19

Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE

Inventor： Chul Jong HAN ,  Yeong Beom LEE ,  Jeongno LEE ,  Kyoungwon PARK ,  Young Ji LIM

IPC: H01L33/46 ,  H01L25/075

CPC classification number: H01L33/46 ,  H01L25/0753 ,  H01L2933/0025

Abstract: A barrier structure of a display device and a method of manufacturing the same are proposed. The barrier structure may include a plurality of light-transmissive photoresist patterns disposed on a substrate at predetermined intervals. The barrier structure may also include reflective films formed on an entire outer surface of the light-transmissive photoresist patterns.