公开(公告)号：US20150355540A1

公开(公告)日：2015-12-10

申请号：US14760089

申请日：2014-03-12

Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE

Inventor： Kwonwoo SHIN ,  Jisun PARK ,  Jinwoo CHO ,  Yoonjin KIM

IPC: G03F7/038

CPC classification number: G03F7/038 ,  B82Y30/00 ,  C09D5/24 ,  C09D7/61 ,  G03F7/0047

Abstract: The present invention relates to a photosensitive coating composition, a conductive coating film using the photosensitive coating composition, and a method for forming the conductive coating film. The present invention provides photosensitive coating composition for forming a conductive coating film, the composition containing a conductive nanomaterial and a photosensitive material. Further, the present invention provides a conductive coating film formed on a substrate, the conductive coating film formed using a photosensitive coating liquid. Here, after the photosensitive coating liquid is coated on the substrate, an exposed region and a non-exposed region are formed by exposure and washing, wherein the non-exposed region has at least two times the conductivity of the exposed region.

Abstract translation: 本发明涉及感光性涂料组合物，使用感光性涂料组合物的导电性涂膜，以及形成导电性涂膜的方法。 本发明提供用于形成导电涂膜的光敏涂料组合物，该组合物含有导电纳米材料和感光材料。 此外，本发明提供一种形成在基板上的导电涂膜，该导电涂膜使用感光涂布液形成。 这里，在将感光性涂布液涂布在基板上之后，通过曝光和洗涤形成曝光区域和未曝光区域，其中非曝光区域具有曝光区域的导电性的至少两倍。