公开(公告)号：US10447286B2

公开(公告)日：2019-10-15

申请号：US15747734

申请日：2016-07-29

Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Jong Cheol Park ,  Hee Yeoun Kim ,  Chung Mo Yang ,  Tae Hyun Kim

IPC: G04F5/14 ,  H03L1/04 ,  H03L7/26 ,  H01L21/02 ,  B81B7/00

Abstract: According to the present invention, since a silicon body itself supporting first and second glass substrates also has a role of an electric heating device, the temperature of the inside of a through-part can be maintained to be constant. In addition, since it is unnecessary to comprise a separate electric heating device such as a heater or to form an additional heating pattern in order to control the temperature of the inside of the through-part, a process for manufacturing a vapor cell can be simplified. According to the present invention, only a reactive material in a gas state and a buffer gas can be injected into a sealed container without the intervention of other materials, and the size of the sealed container can be reduced since it is unnecessary to prepare e separate space for mounting a pill of the reaction material in a vapor cell region itself.