System and method for photomask alignment and orientation characterization based on notch detection

    公开(公告)号:US10354373B2

    公开(公告)日:2019-07-16

    申请号:US15908553

    申请日:2018-02-28

    Abstract: A notch detection system receives images of a sample from the imaging detector, in which the sample includes a notched surface and an un-notched surface bounded by a sidewall and further includes at least one notch known notch specifications. The images are generated such that illumination unobstructed by the sample is received by the detector and the sample prevents incident illumination from reaching the detector. The system further determines whether each image includes a notch, identifies the notched surface, and directs a sample positioner to position the sample with the notched surface in a selected direction when a notch is identified in at least one image of the one or more images.

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