公开(公告)号：US09704238B2

公开(公告)日：2017-07-11

申请号：US14950546

申请日：2015-11-24

Applicant: KLA-Tencor Corporation

Inventor： Stefan Eyring ,  Oliver Ache ,  Frank Laske

IPC: G06K9/00 ,  G06T7/00 ,  G03F7/20 ,  G06K9/52 ,  G03F1/44 ,  G03F1/84 ,  G06T7/33 ,  G06T7/73 ,  G06T7/246 ,  G06T7/62

CPC classification number: G06T7/001 ,  G03F1/44 ,  G03F1/84 ,  G03F7/70633 ,  G06K9/52 ,  G06T7/248 ,  G06T7/337 ,  G06T7/62 ,  G06T7/74 ,  G06T2207/30148

Abstract: A method for correcting optical errors occurring in coordinates of positions of a plurality of targets measured via an imaging system comprising a field of view. The plurality of targets includes a first array of targets and a second array of targets overlapping the first array of targets, and a portion of the plurality of targets are outside of the field of view. The method broadly includes the following steps: a) placing the first array of targets in the field of view of the imaging system; b) measuring coordinates of each target within the first array of targets repeatedly via the imaging system; c) placing the second array of targets in the field of view of the imaging system; d) measuring coordinates of each target within the second array of targets repeatedly via the imaging system; e) determining an alignment function from the measurement results of step b, step d, or steps b and d, the alignment function being a function of coordinates of the field of view of the imaging system and giving an additive correction for optical errors of the coordinates of positions of the plurality of targets measured by the imaging system; f) correcting the coordinates of the positions of the plurality of targets measured by the imaging system by adding the respective value of the alignment function at the field-of-view coordinates at which the coordinates of the position of the respective target were measured; and, g) obtaining a final result for the position of each target of the plurality of targets by averaging over the corrected coordinates found in step f for the respective target at each relative position of the plurality of targets and field of view of the imaging system.

公开(公告)号：US20160078609A1

公开(公告)日：2016-03-17

申请号：US14950546

申请日：2015-11-24

Applicant: KLA-Tencor Corporation

Inventor： Stefan Eyring ,  Oliver Ache ,  Frank Laske

IPC: G06T7/00 ,  G06T7/60 ,  G06T7/20 ,  G06K9/52

CPC classification number: G06T7/001 ,  G03F1/44 ,  G03F1/84 ,  G03F7/70633 ,  G06K9/52 ,  G06T7/248 ,  G06T7/337 ,  G06T7/62 ,  G06T7/74 ,  G06T2207/30148

Abstract: A method for correcting optical errors occurring in coordinates of positions of a plurality of targets measured via an imaging system comprising a field of view. The plurality of targets includes a first array of targets and a second array of targets overlapping the first array of targets, and a portion of the plurality of targets are outside of the field of view. The method broadly includes the following steps: a) placing the first array of targets in the field of view of the imaging system; b) measuring coordinates of each target within the first array of targets repeatedly via the imaging system; c) placing the second array of targets in the field of view of the imaging system; d) measuring coordinates of each target within the second array of targets repeatedly via the imaging system; e) determining an alignment function from the measurement results of step b, step d, or steps b and d, the alignment function being a function of coordinates of the field of view of the imaging system and giving an additive correction for optical errors of the coordinates of positions of the plurality of targets measured by the imaging system; f) correcting the coordinates of the positions of the plurality of targets measured by the imaging system by adding the respective value of the alignment function at the field-of-view coordinates at which the coordinates of the position of the respective target were measured; and, g) obtaining a final result for the position of each target of the plurality of targets by averaging over the corrected coordinates found in step f for the respective target at each relative position of the plurality of targets and field of view of the imaging system.

Abstract translation: 一种用于校正通过包括视场的成像系统测量的多个目标的位置坐标发生的光学误差的方法。 所述多个目标包括目标的第一阵列和与所述第一目标阵列重叠的目标的第二阵列，并且所述多个目标的一部分在所述视野外。 该方法广泛地包括以下步骤：a）将第一阵列的目标放置在成像系统的视野内; b）经由成像系统重复地测量第一阵列目标内的每个目标的坐标; c）将所述第二阵列阵列放置在所述成像系统的视野内; d）经由成像系统重复地测量第二阵列内的每个目标的坐标; e）根据步骤b，步骤d或步骤b和d的测量结果确定对准功能，所述对准功能是成像系统的视场坐标的函数，并给出对于所述成像系统的光学误差的附加校正 由成像系统测量的多个目标的位置坐标; f）通过在测量各个目标的位置的坐标的视场坐标附加相应的对准功能的值来校正由成像系统测量的多个目标的位置的坐标; 以及g）通过对所述多个目标的每个相对位置处的各个目标的步骤f中找到的所述校正坐标和所述成像系统的视场进行平均来获得所述多个目标中的每个目标的位置的最终结果 。

公开(公告)号：US20140307949A1

公开(公告)日：2014-10-16

申请号：US14302708

申请日：2014-06-12

Applicant: KLA-Tencor Corporation

Inventor： Stefan Eyring ,  Oliver Ache ,  Frank Laske

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G03F1/44 ,  G03F1/84 ,  G03F7/70633 ,  G06K9/52 ,  G06T7/248 ,  G06T7/337 ,  G06T7/62 ,  G06T7/74 ,  G06T2207/30148

Abstract: A method is disclosed for correcting errors introduced by optical distortions or aberrations in the measured values of coordinates of targets of an array of targets, like for example structures on a wafer or a photolithography mask. The array of targets is placed into a field of view of an imaging system via which the coordinates are to be measured. The array of targets is placed at different relative positions with respect to the field of view, and for each relative position the coordinates of the targets relative to the array of targets are determined by measurements. From the results of these measurements an alignment function, giving a correction for optical errors as a function of the position in the field of view, is derived. The measured coordinates are corrected by the alignment function. The corrected coordinates can be used to identify registration errors of a mask writer.

Abstract translation: 公开了一种用于校正由目标阵列的目标坐标的测量值中的光学失真或像差引入的误差的方法，例如晶片或光刻掩模上的结构。 目标阵列被放置在成像系统的视场中，坐标将被测量。 目标阵列相对于视场位于不同的相对位置，并且对于每个相对位置，靶相对于目标阵列的坐标由测量确定。 从这些测量结果可得出对准函数，作为视场中的位置的函数的光学误差的校正。 测量的坐标通过对准功能进行校正。 校正的坐标可用于识别掩码写入器的注册错误。

公开(公告)号：US10337852B1

公开(公告)日：2019-07-02

申请号：US16007192

申请日：2018-06-13

Applicant: KLA-TENCOR CORPORATION

Inventor： Oliver Ache ,  Frank Laske

IPC: G01B11/24 ,  G01B11/00

Abstract: A method with increased throughput for measuring positions of structures on a substrate is disclosed. The substrate is taken from a load port of a metrology machine and is placed immediately in a stage of the metrology machine. At least two measurement loops are carried out, wherein a first measurement loop is started at a time when a substrate temperature is different from the temperature at the stage, and at least one second measurement loop is started at a time after the first measurement loop when the substrate temperature is different from the temperature at the stage. A model is used to calculate from the measured data, taken while there is a temperature mismatch between the stage and the substrate, a real grid of positions of structures on the substrate, corresponding to a situation where the temperature of the stage matches the temperature of the substrate.

公开(公告)号：US20190186893A1

公开(公告)日：2019-06-20

申请号：US16007192

申请日：2018-06-13

Applicant: KLA-TENCOR CORPORATION

Inventor： Oliver Ache ,  Frank Laske

IPC: G01B11/00

CPC classification number: G01B11/005 ,  G01B2210/56

Abstract: A method with increased throughput for measuring positions of structures on a substrate is disclosed. The substrate is taken from a load port of a metrology machine and is placed immediately in a stage of the metrology machine. At least two measurement loops are carried out, wherein a first measurement loop is started at a time when a substrate temperature is different from the temperature at the stage, and at least one second measurement loop is started at a time after the first measurement loop when the substrate temperature is different from the temperature at the stage. A model is used to calculate from the measured data, taken while there is a temperature mismatch between the stage and the substrate, a real grid of positions of structures on the substrate, corresponding to a situation where the temperature of the stage matches the temperature of the substrate.

公开(公告)号：US09201312B2

公开(公告)日：2015-12-01

申请号：US14302708

申请日：2014-06-12

Applicant: KLA-Tencor Corporation

Inventor： Stefan Eyring ,  Oliver Ache ,  Frank Laske

IPC: G06K9/00 ,  G03F7/20

CPC classification number: G06T7/001 ,  G03F1/44 ,  G03F1/84 ,  G03F7/70633 ,  G06K9/52 ,  G06T7/248 ,  G06T7/337 ,  G06T7/62 ,  G06T7/74 ,  G06T2207/30148

Abstract: A method is disclosed for correcting errors introduced by optical distortions or aberrations in the measured values of coordinates of targets of an array of targets, like for example structures on a wafer or a photolithography mask. The array of targets is placed into a field of view of an imaging system via which the coordinates are to be measured. The array of targets is placed at different relative positions with respect to the field of view, and for each relative position the coordinates of the targets relative to the array of targets are determined by measurements. From the results of these measurements an alignment function, giving a correction for optical errors as a function of the position in the field of view, is derived. The measured coordinates are corrected by the alignment function. The corrected coordinates can be used to identify registration errors of a mask writer.

Abstract translation: 公开了一种用于校正由目标阵列的目标坐标的测量值中的光学失真或像差引入的误差的方法，例如晶片或光刻掩模上的结构。 目标阵列被放置在成像系统的视场中，坐标将被测量。 目标阵列相对于视场位于不同的相对位置，并且对于每个相对位置，靶相对于目标阵列的坐标由测量确定。 从这些测量结果可得出对准函数，作为视场中的位置的函数的光学误差的校正。 测量的坐标通过对准功能进行校正。 校正的坐标可用于识别掩码写入器的注册错误。