公开(公告)号：US09141002B2

公开(公告)日：2015-09-22

申请号：US13784402

申请日：2013-03-04

Applicant: KLA-Tencor Corporation

Inventor： Salam Harb ,  Kent Douglas ,  Marek Zywno ,  James Haslim ,  Jon Hamilton

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/683

CPC classification number: G03F7/70758 ,  H01L21/68 ,  H01L21/6831 ,  Y10T74/20006 ,  Y10T279/21 ,  Y10T279/23 ,  Y10T279/27

Abstract: Substrate support apparatus and methods are disclosed. Motion of a substrate chuck relative to a stage mirror may be dynamically compensated by sensing a displacement of the substrate chuck relative to the stage mirror and coupling a signal proportional to the displacement in one or more feedback loops with Z stage actuators and/or XY stage actuators coupled to the stage mirror. Alternatively, a substrate support apparatus may include a Z stage plate a stage mirror, one or more actuators attached to the Z stage plate, and a substrate chuck mounted to the stage mirror with constraints on six degrees of freedom of movement of the substrate chuck. The actuators impart movement to the Z stage in a Z direction as the Z stage plate is scanned in a plane perpendicular to the Z direction. The actuators may include force flexures having a base portion attached to the Z stage plate and a cantilever portion extending in a lateral direction from the base portion. The cantilever portion may include a parallelogram flexure coupled between the base portion and a free end of the cantilever portion.

Abstract translation: 公开了基板支撑装置和方法。 衬底卡盘相对于舞台反射镜的运动可以通过感测衬底卡盘相对于舞台镜的位移而被动态地补偿，并将与一个或多个反馈回路中的位移成比例的信号与Z级致动器和/或XY平台 耦合到舞台镜的致动器。 或者，基板支撑装置可以包括Z平台板，平台反射镜，附接到Z平台板的一个或多个致动器以及安装到平台反射镜的基板卡盘，其具有基板卡盘的六个自由度的限制。 当Z平台板在与Z方向垂直的平面中扫描时，执行器在Z方向上向Z平台施加移动。 致动器可以包括具有附接到Z平台板的基部部分和从基部沿横向方向延伸的悬臂部分的力弯曲。 悬臂部分可以包括耦合在基部和悬臂部分的自由端之间的平行四边形弯曲部。

公开(公告)号：US20130105108A1

公开(公告)日：2013-05-02

申请号：US13661146

申请日：2012-10-26

Applicant: KLA-TENCOR CORPORATION

Inventor： Marek Zywno ,  Layton Carter Hale

IPC: G05D23/19 ,  F25B29/00

CPC classification number: G05D23/19 ,  F25B29/00 ,  H01J37/20 ,  H01J2237/2001 ,  H01J2237/31701 ,  H01J2237/3175 ,  H01L21/67109

Abstract: Systems and methods to precisely balance the amount of heat removed from a specimen with the amount of heat generated during processing are presented. In some embodiments, the heat introduced into the specimen is rapidly removed by a temperature controlled cooling element via radiative heat transfer. In some embodiments, a heating element is disposed between the specimen and the cooling element. The heating element is controlled to precisely balance the amount of heat removed from the specimen with the amount of heat generated. A control signal is generated based on the amount of process energy known apriori. The control signal may also be based on an indication of a temperature of the specimen. In some embodiments, an adjustable aperture is employed to change the surface area of the cooling element exposed to the specimen, and thus control the amount of heat absorbed from the specimen by the cooling element.

Abstract translation: 提出了精确平衡从样品中除去的热量与处理过程中产生的热量的系统和方法。 在一些实施例中，通过辐射热传递通过温度控制的冷却元件快速去除引入样品的热量。 在一些实施例中，加热元件设置在样品和冷却元件之间。 控制加热元件以精确地平衡从样品除去的热量与产生的热量。 基于已知的过程能量的量来生成控制信号。 控制信号也可以基于样本温度的指示。 在一些实施例中，采用可调节孔来改变暴露于样品的冷却元件的表面积，从而控制由冷却元件从样品吸收的热量。