公开(公告)号：US20220056373A1

公开(公告)日：2022-02-24

申请号：US17416420

申请日：2019-08-07

Applicant: KCTECH CO., LTD.

Inventor： Ga Young JUNG ,  Yong Ho JEONG ,  Kun Hee PARK ,  Young Gon KIM ,  Young Ho YOON ,  Young Lok YOON

IPC: C11D3/20 ,  C11D11/00 ,  C11D3/34 ,  C11D3/36 ,  C11D1/14 ,  C11D1/34

Abstract: The present disclosure relates to a cleaning liquid composition and a cleaning method using the same. A polishing slurry composition according to an embodiment of the present disclosure includes: a chelating agent containing an organic salt; and an anionic surfactant.