Abstract:
A hydraulic oil tank attachment structure arranged in a construction machine secures the strength of a hydraulic oil tank as well as secures a large capacity thereof. The attachment structure is arranged in a compact excavator provided with a revolving superstructure, a working device attached to the revolving superstructure, a hydraulic actuator including a revolving motor that drives the revolving superstructure and an actuator that drives the working device. A hydraulic oil tank made of synthetic resin, which stores hydraulic oil to be supplied to the hydraulic actuator, is attached on a revolving frame of the revolving superstructure. The hydraulic oil tank attachment structure has a holding member provided with a projecting part formed on a side surface of the tank, which is fixed on the revolving frame of the revolving superstructure so as to surround side surfaces thereof to hold the hydraulic oil tank via the projecting part.
Abstract:
A hydraulic oil tank attachment structure arranged in a construction machine secures the strength of a hydraulic oil tank as well as secures a large capacity thereof. The attachment structure is arranged in a compact excavator provided with a revolving superstructure, a working device attached to the revolving superstructure, a hydraulic actuator including a revolving motor that drives the revolving superstructure and an actuator that drives the working device. A hydraulic oil tank made of synthetic resin, which stores hydraulic oil to be supplied to the hydraulic actuator, is attached on a revolving frame of the revolving superstructure. The hydraulic oil tank attachment structure has a holding member provided with a projecting part formed on a side surface of the tank, which is fixed on the revolving frame of the revolving superstructure so as to surround side surfaces thereof to hold the hydraulic oil tank via the projecting part.
Abstract:
A hydraulic oil tank capable of assuring strength at a gage installation part and bringing a gage close to a hole portion of an exterior cover while maintaining a predetermined clearance between the exterior cover and the hydraulic oil tank is provided. The hydraulic oil tank, mounted on a swing frame of a hydraulic excavator upperstructure, has a side wall opposing an upperstructure exterior cover with a predetermined clearance, and is adapted to store hydraulic oil to be fed to hydraulic actuators. The hydraulic oil tank has a gage enabling a visual check on the hydraulic oil level in the tank through a hole portion in the exterior cover. The gage is installed in the tank side wall, with an internally-hollow protruding portion protruding toward the exterior cover hole portion and a transparent window portion arranged at an end of the protruding portion.
Abstract:
A hydraulic oil tank capable of assuring strength at a gage installation part and bringing a gage close to a hole portion of an exterior cover while maintaining a predetermined clearance between the exterior cover and the hydraulic oil tank is provided. The hydraulic oil tank, mounted on a swing frame of a hydraulic excavator upperstructure, has a side wall opposing an upperstructure exterior cover with a predetermined clearance, and is adapted to store hydraulic oil to be fed to hydraulic actuators. The hydraulic oil tank has a gage enabling a visual check on the hydraulic oil level in the tank through a hole portion in the exterior cover. The gage is installed in the tank side wall, with an internally-hollow protruding portion protruding toward the exterior cover hole portion and a transparent window portion arranged at an end of the protruding portion.
Abstract:
A foreign particle inspection apparatus includes a light projecting unit, a photo-receiving unit which receives the scattered light, and a. The photo-receiving unit is arranged such that its optical axis is tilted by a first angle with respect to a plane including the optical axis and the normal axis to the surface. When the angle of the polarization axis of the projected light with respect to the plane is defined as a second angle, the controller controls at least one of the polarization axis and the arrangement of the photo-receiving unit so that the differences between the first angle and the second angle become a first state and a second state, thereby determining a foreign particle based on the outputs from the photo-receiving unit in the first state and the second state.
Abstract:
A position measurement apparatus includes a first beam splitter configured to split light from a light source into reference light and measurement light, a reference mirror configured to receive the reference light and a second beam splitter configured to synthesize the reference light reflected on the reference mirror with the measurement light that enters and is reflected on an object to be measured. The position measurement apparatus drives an object to be measured through a driving mechanism, detects the interference pattern through a photoelectric conversion element, and calculates a surface position of the object to be measured based on a change of a detection signal obtained from the interference pattern. The position measurement apparatus further includes a selector configured to select a signal from an interference area between reflected measurement light and reflected reference light.
Abstract:
An exposure method for exposing a pattern of a reticle onto a plate, via a projection optical system, while synchronously scanning the reticle and the plate. The exposure method includes the steps of (a) measuring before exposing, the measuring step including (i) a first substep of obtaining surface form data that shows a surface form of the reticle, and (ii) a second substep of detecting a measurement position having an abnormal measurement result as an error measurement position among measurement positions, to measure the surface form of the reticle based on a measurement result of the obtaining substep, and (b) controlling synchronous scanning of the reticle and the plate using the measurement result of the detecting substep, except for the detecting result of the error measurement position.
Abstract:
An exposure method for exposing a pattern of a reticle onto a plate, via a projection optical system, while synchronously scanning the reticle and the plate, said exposure method comprising the steps of obtaining surface form data that shows a surface form of the reticle, and controlling synchronous scanning of the reticle and the plate based on the surface form data, wherein said surface form obtaining step includes the steps of detecting a measurement position having an abnormal measurement result as an error measurement position among measurement positions to measure the surface form of the reticle, and measuring the surface form of the reticle at a scan speed used for exposure, and wherein said controlling step uses, as the surface form data, a measurement result of the measuring step that excludes a measurement result with the error measurement position.
Abstract:
A photocurable resin composition comprising a propenyl ether group-containing compound (A) having propenyl ether groups of the following formula (1) and having a number-average molecular weight of not less than 500, and a cationic photopolymerization initiator (B).CH.sub.3 --CH.dbd.CH--O-- (1)The object is to provide a photocurable resin composition which cures at a higher speed than a vinyl ether compound on exposure to light irradiation, and has improved flow characteristics, physical property of cured resin, and adhesion to metal.
Abstract:
A position detecting system including a detecting system for detecting positions, at different points on a surface of a reticle having a predetermined pattern formed thereon, with respect to a direction substantially perpendicular to the reticle surface, wherein the detecting system includes a light projecting portion for directing light from a light source to the reticle surface and a light receiving portion for receiving reflection light from the reticle surface, and wherein the angle of incidence of light from the light projecting portion, being incident on the reticle surface, is not less than 45 degrees.