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公开(公告)号：US20150147469A1
公开(公告)日：2015-05-28
申请号：US14607394
申请日：2015-01-28
IPC分类号： C01B33/193 , C08K3/36
CPC分类号： C01B33/193 , C01B33/18 , C08K3/36 , C08K7/26 , C09C1/30 , C09D7/61 , C09D7/67 , C09D7/68 , Y10T428/2995 , Y10T428/31935
摘要： A method of producing silica-based particles includes, when a dispersion liquid of composite oxide particles is prepared by simultaneously adding an aqueous silicate solution and/or an acidic silicic acid solution and an aqueous solution of an alkali-soluble inorganic compound in an alkali aqueous solution or in an alkali aqueous solution with seed particles dispersed therein, if required, the aqueous silicate solution and/or the acidic silicic acid solution and the aqueous solution of alkali-soluble inorganic compound are added so that the molar ratio of MOx/SiO2 are in a range from 0.01 to 2, herein MOx denoting an inorganic oxide other than silica and SiO2 denoting silica to prepare the dispersion liquid of composite oxide particles with an average diameter (Dp1) in a range from 3 to 300 nm.
摘要翻译： 制备二氧化硅基颗粒的方法包括：当复合氧化物颗粒的分散液通过同时加入硅酸盐水溶液和/或酸性硅酸溶液和碱溶性无机化合物的水溶液在碱性水溶液 溶液或其中分散有种子颗粒的碱性水溶液，如果需要，加入硅酸水溶液和/或酸性硅酸溶液和碱溶性无机化合物的水溶液，使得MO x / SiO 2的摩尔比为 在0.01〜2的范围内，MOx表示二氧化硅以外的无机氧化物和表示二氧化硅的SiO 2，制备平均直径（Dp1）为3〜300nm的复合氧化物粒子的分散液。
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公开(公告)号：US20180179076A1
公开(公告)日：2018-06-28
申请号：US15855092
申请日：2017-12-27
CPC分类号： C01B33/18 , C01P2004/62 , C01P2004/64 , C09G1/02 , C09K3/1409
摘要： Producing a silica particle by inhibiting the generation of incompletely reacted materials such as oligomers which have not been grown to the silica particles having the intended particle size. A dispersion liquid of a silica particle is produced by simultaneously adding, to a liquid substantially consisting of an organic solvent, a liquid containing silane alkoxide and a liquid containing an alkali catalyst and water to cause hydrolysis and polycondensations to produce a silica particle. The variation rate of the mole ratio of the alkali catalyst to silane alkoxide in the reaction system for a period from the start to the end of the reaction relative to the initial mole ratio is 0.90 to 1.10; and the variation rate of the mole ratio of water to silane alkoxide for a period from the start to the end of the reaction relative to the initial mole ratio is 0.90 to 1.10.
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公开(公告)号：US20210002513A1
公开(公告)日：2021-01-07
申请号：US17040779
申请日：2019-03-28
发明人： Miki EGAMI , Mitsuaki KUMAZAWA , Ryo MURAGUCHI , Michio KOMATSU
IPC分类号： C09G1/02 , C09K3/14 , C01B33/141
摘要： A polishing composition that can not only achieve high polishing speed, but also can improve the surface smoothness (surface quality) of a polished substrate and reduce defects is provided. That is, provided is a polishing composition comprising silica particles and a water soluble polymer, wherein the contained silica particles satisfy the following requirements (a) to (c): (a) the primary particle diameter based on the specific surface area is 5 to 300 nm; (b) the coefficient of variation in the particle diameter is 10% or less; and (c) the Sears number Y is 10.0 to 12.0.
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公开(公告)号：US20180155591A1
公开(公告)日：2018-06-07
申请号：US15829128
申请日：2017-12-01
CPC分类号： C09G1/02 , C01B33/12 , C01P2004/54 , C01P2004/64 , C09K3/1409
摘要： Provided is a silica-based polishing particle, particularly suitable for primary polishing, which provides a high polishing rate on the surface of a substrate and which prevents particle residues on the substrate after polishing, and an abrasive including the silica-based polishing particle. A silica-based polishing particle with a three-dimensional polycondensation structure containing an alkoxy group, wherein the particle has an average particle diameter (d) of 5 to 300 nm, an aspect ratio of more than 1.20 and 5.00 or less, and a carbon content of 0.005% by mass or more and less than 0.50% by mass.
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公开(公告)号：US20210094832A1
公开(公告)日：2021-04-01
申请号：US17029716
申请日：2020-09-23
发明人： Miki EGAMI , Mitsuaki KUMAZAWA , Ryo MURAGUCHI , Michio KOMATSU
IPC分类号： C01B33/141 , C09G1/02 , C09K3/14
摘要： A silica particle dispersion liquid includes a silica particle that satisfies (i) to (iii) below: (i) an average particle diameter d is 5 to 300 nm; (ii) an occlusion amount of a basic substance per 1 g of the particle is 2 mg or more; and (iii) a Sears number Y exceeds 12.0.
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公开(公告)号：US20200231451A1
公开(公告)日：2020-07-23
申请号：US16498433
申请日：2018-03-29
IPC分类号： C01B33/141 , C09K3/14 , C09G1/02
摘要： A method for producing a dispersion liquid of silica particles, by simultaneously adding a liquid A containing silane alkoxide and a liquid B containing an alkali catalyst and water to a liquid I containing silica seed particles to cause the particles to grow, so as to produce silica particles; wherein the variation rate of the mole ratio of the alkali catalyst to silica components in the reaction system during a period from the start to the end of the addition relative to the initial mole ratio is 0.90 to 1.10; and the variation rate of the mole ratio of water to the silica components in the reaction system during a period from the start to the end of the addition relative to the initial mole ratio is 0.90 to 1.10.
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公开(公告)号：US20180127627A1
公开(公告)日：2018-05-10
申请号：US15804251
申请日：2017-11-06
CPC分类号： C09G1/02 , C01B33/124 , C01B33/18 , C01P2004/32 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/80 , C09K3/1409 , C09K3/1454
摘要： Provided is a silica-based polishing particle which can polish and flatten the surface of a substrate at a sufficient polishing rate with generation of scratches prevented, and successfully prevents generation of particle residues on a substrate after polishing. A silica-based polishing particle with a three-dimensional polycondensation structure containing an alkoxy group, wherein the particle has an average particle diameter (d) of 5 to 300 nm, an aspect ratio of 1.00 or more and 1.20 or less, and a carbon content of 0.005% by mass or more and less than 0.50% by mass.
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