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公开(公告)号：US12083621B2
公开(公告)日：2024-09-10
申请号：US17274695
申请日：2019-09-03
发明人： Jan Werschnik , Stefan Franz , Achmed Esselbach
CPC分类号： B23K26/0648 , B23K26/046 , G02B7/08 , G02B15/14 , G02B19/0014 , G02B19/0047 , G02B27/0955
摘要： An apparatus (112) for focus adjustment for a device (100) for laser material processing, which has a movably arranged first lens unit (124), which comprises a first lens (108), and a movably arranged second lens unit (126), which comprises a second lens (110), has an adjustment device (114) which is designed to move the first lens unit (124) in a first direction (116) and to move the second lens unit (126) in a second direction (118) opposite to the first direction (116) in order to adjust a distance between the first lens (108) and the second lens (110) for the focus adjustment.
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公开(公告)号：US10732423B2
公开(公告)日：2020-08-04
申请号：US15571399
申请日：2016-06-22
摘要： The invention relates to a device (102) for optical beam expansion of an optical system having a guide tube (220), a first guide cylinder (222) having a first lens (226), wherein the first guide cylinder (202) is arranged within the guide tube (220) so as to be displaceable along the longitudinal axis of the guide tube (220), and a second guide cylinder (224) having a second lens (228), wherein the second guide cylinder (224) is arranged within the guide tube (220) so as to be displaceable along the longitudinal axis of the guide tube (220). A first displacement device is provided to displace the first guide cylinder (222) along the longitudinal axis (340) of the guide tube (220), and a second displacement device is provided to displace the second guide cylinder (224) along the longitudinal axis of the guide tube (220).
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公开(公告)号：US09964730B2
公开(公告)日：2018-05-08
申请号：US15121226
申请日：2015-02-26
发明人： Torsten Erbe , Jan Werschnik
摘要： Mount assembly with a monolithic mount formed by a mount ring with a plurality of retaining arms with free ends and an element, which retaining arms are arranged concentrically around the axis of symmetry of the mount ring and extend at least partially in axial direction. Three of the retaining arms contact an end face formed at the element and hold the element axially, while the other retaining arms are bonded to a circumferential surface formed at the element and prevent the element in particular from rotating.
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公开(公告)号：US20140118711A1
公开(公告)日：2014-05-01
申请号：US13820399
申请日：2012-03-08
发明人： Jan Werschnik , Markus Augustin , Lutz Reichmann
IPC分类号： H01L21/67
CPC分类号： G03F7/70208 , G02B3/0056 , G02B26/0841 , G03F7/7005 , G03F7/70291 , H01L21/67069
摘要： The invention relates to an exposure device (14) for the structured exposure of a wafer, having at least one exposure arrangement with which a beam that is separated into two sub-beams is modulated via two micromirror arrays in order to increase the throughput speed during the exposure of wafers.
摘要翻译： 本发明涉及一种用于晶片结构曝光的曝光装置（14），其具有至少一个曝光装置，通过两个微镜阵列调制分离成两个子光束的光束，以便增加在 晶圆的曝光。
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公开(公告)号：US09971149B2
公开(公告)日：2018-05-15
申请号：US14654076
申请日：2013-12-13
发明人： Jan Werschnik , Markus Augustin
CPC分类号： G02B27/0012 , G02B27/0025 , G06F17/10 , G06F17/50
摘要： The invention relates to a method for producing a wavefront-corrected optical arrangement comprising at least two optical elements. Using the method, a total wavefront error in the optical arrangement is determined and compared to a permissible tolerance range for the total wavefront error. To perform the method, the optical elements are individualized by assigning an individual identifier to each of them, such that individualized optical elements are obtained, individual surface defects are measured with correct coordinates on all the individualized optical elements and the measured individual surface defects are stored with correct coordinates assigned to the appropriate individualized optical element. The optical arrangement comprising the individualized optical elements is produced virtually as a virtual optical arrangement and a total wavefront error is calculated for the virtual optical arrangement.
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公开(公告)号：US09829702B2
公开(公告)日：2017-11-28
申请号：US15125383
申请日：2015-03-10
发明人： Torsten Erbe , Jan Werschnik
CPC分类号： G02B27/0068 , G02B7/1821 , G02B26/0825
摘要： The invention relates to an adjustable, deformable mirror for compensating irregularities of a beam with a mirror element for reflecting incident rays of the beam, a base body for securing the mirror element and at least one actuating element for applying forces to the mirror element, wherein the mirror element is a planar element with a thickness of at least 1 mm, and the actuating element is a lever mechanism with lever elements. The invention also relates to a method for compensating irregularities of a beam as well as an optical arrangement with a mirror according to the invention.
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