公开(公告)号：US12082381B2

公开(公告)日：2024-09-03

申请号：US17335743

申请日：2021-06-01

Applicant: Huawei Technologies Co., Ltd.

Inventor： Denis Yurchenko ,  Hao Sun ,  Sergey Khairnasov

IPC: H05K7/20 ,  F28F3/12

CPC classification number: H05K7/20809 ,  F28F3/12 ,  H05K7/20336 ,  H05K7/20409 ,  H05K7/20418 ,  F28F2225/04

Abstract: A vapor chamber includes a first base plate (12), a second base plate (13), and a capillary structure (15). The first base plate (12) and the second base plate (13) are disposed in a stacked manner and fastened to each other, and together form a cavity (11). The capillary structure is disposed on an inner wall of the cavity (11) and a surface of at least one support pillar (120) between the first base plate (12) and the second base plate (13), and the capillary structure (15) is configured to provide capillary force for returning liquid to a working medium. A reinforcement table (127) located in the cavity (11) is disposed between the first base plate (12) and the second base plate (13).

公开(公告)号：US20210289669A1

公开(公告)日：2021-09-16

申请号：US17335743

申请日：2021-06-01

Applicant: Huawei Technologies Co., Ltd.

Inventor： Denis Yurchenko ,  Hao Sun ,  Sergey Khairnasov

IPC: H05K7/20 ,  F28F3/12

Abstract: A vapor chamber includes a first base plate (12), a second base plate (13), and a capillary structure (15). The first base plate (12) and the second base plate (13) are disposed in a stacked manner and fastened to each other, and together form a cavity (11). The capillary structure is disposed on an inner wall of the cavity (11) and a surface of at least one support pillar (120) between the first base plate (12) and the second base plate (13), and the capillary structure (15) is configured to provide capillary force for returning liquid to a working medium. A reinforcement table (127) located in the cavity (11) is disposed between the first base plate (12) and the second base plate (13).