公开(公告)号：US20200161096A1

公开(公告)日：2020-05-21

申请号：US16688857

申请日：2019-11-19

申请人： Hong-Young CHANG ,  Sang-Hun Seo ,  Yun-Seong Lee

发明人： Hong-Young CHANG ,  Sang-Hun Seo ,  Yun-Seong Lee

IPC分类号： H01J37/32

摘要： Provided are a plasma generating apparatus and a substrate treating apparatus. The plasma generating apparatus includes a plurality of ground electrodes arranged inside a vacuum container and extending parallel to each other and power electrodes arranged between the ground electrodes. An area where a distance between the ground electrode and the power electrode is constant exists, and the power electrodes are tapered in a direction facing the substrate. The power electrodes are connected to an RF power source, and height of the power electrode is greater than that of the ground electrode in the direction facing the substrate.

公开(公告)号：US20140007812A1

公开(公告)日：2014-01-09

申请号：US14004411

申请日：2012-03-29

申请人： Hong-Young Chang ,  Sang-Hun Seo ,  Yun-Seong Lee

发明人： Hong-Young Chang ,  Sang-Hun Seo ,  Yun-Seong Lee

IPC分类号： H01J37/32

摘要： Provided are a plasma generating apparatus and a substrate treating apparatus. The plasma generating apparatus includes a plurality of ground electrodes arranged inside a vacuum container and extending parallel to each other and power electrodes arranged between the ground electrodes. An area where a distance between the ground electrode and the power electrode is constant exists, and the power electrodes are tapered in a direction facing the substrate. The power electrodes are connected to an RF power source, and height of the power electrode is greater than that of the ground electrode in the direction facing the substrate.

摘要翻译： 提供了一种等离子体发生装置和基板处理装置。 等离子体发生装置包括布置在真空容器内并且彼此平行延伸的多个接地电极和布置在接地电极之间的电力电极。 接地电极和功率电极之间的距离恒定的区域存在，并且功率电极在面向衬底的方向上是锥形的。 电源电极连接到RF电源，并且功率电极的高度大于接地电极在朝向衬底的方向上的高度。

公开(公告)号：US10553406B2

公开(公告)日：2020-02-04

申请号：US14004411

申请日：2012-03-29

申请人： Hong-Young Chang ,  Sang-Hun Seo ,  Yun-Seong Lee

发明人： Hong-Young Chang ,  Sang-Hun Seo ,  Yun-Seong Lee

IPC分类号： H01J37/32

摘要： Provided are a plasma generating apparatus and a substrate treating apparatus. The plasma generating apparatus includes a plurality of ground electrodes arranged inside a vacuum container and extending parallel to each other and power electrodes arranged between the ground electrodes. An area where a distance between the ground electrode and the power electrode is constant exists, and the power electrodes are tapered in a direction facing the substrate. The power electrodes are connected to an RF power source, and height of the power electrode is greater than that of the ground electrode in the direction facing the substrate.