公开(公告)号：US20030006373A1

公开(公告)日：2003-01-09

申请号：US10183157

申请日：2002-06-28

Applicant: Hitachi. Ltd.

Inventor： Masanari Koguchi ,  Kuniyasu Nakamura ,  Kaoru Umemura ,  Yoshifumi Taniguchi ,  Mikio Ichihashi

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J37/2955 ,  H01J2237/2802

Abstract: Disclosed is an observation apparatus and method using an electron beam, capable of measuring information regarding a crystal structure in a specimen (such as information regarding stress and strain in the specimen) with high sensitivity and high resolution from an electron beam diffraction image obtained by irradiating the specimen with an electron beam. An observation method according to the invention includes: a step of mounting a specimen on a specimen stage; an enlarged image acquiring step of irradiating a predetermined area in the specimen with an electron beam while scanning the electron beam, and acquiring an enlarged image of a specimen internal structure in the predetermined area in the specimen by using the electron beam passed through the specimen; a diffraction image acquiring step of irradiating a specific portion included in the predetermined area in the specimen with the electron beam and acquiring a diffraction image including information of a crystal structure in the specimen in the specific portion in the specimen, formed by the electron beam diffracted in the specimen; a crystal structure information extracting step of extracting information of the crystal structure in the specimen from the diffracted image acquired in the diffraction image acquiring step; and a superimposing and displaying step of displaying the information of the crystal structure in the specimen extracted in the crystal structure information extracting step so as to be superimposed on the enlarged image acquired in the enlarged image acquiring step. The observation method according to the invention can obtain information of the crystal structure in a specimen with high sensitivity and high resolution.

Abstract translation: 公开了一种使用电子束的观察装置和方法，其能够从通过照射获得的电子束衍射图像以高灵敏度和高分辨率测量样品中的晶体结构的信息（诸如样品中的应力和应变的信息） 具有电子束的样品。 根据本发明的观察方法包括：将试样安装在试样台上的步骤; 放大图像获取步骤，在扫描电子束的同时用电子束照射样本中的预定区域，并且通过使用通过样本的电子束获取样本中的预定区域中的样本内部结构的放大图像; 衍射图像获取步骤，用电子束照射样本中的预定区域中的特定部分，并获取包含由电子束衍射形成的样本中的样本中的样本中的晶体结构信息的衍射图像 在标本中 晶体结构信息提取步骤，从衍射图像获取步骤中获取的衍射图像提取样本中的晶体结构的信息; 以及叠加显示步骤，用于在晶体结构信息提取步骤中提取的样本中显示晶体结构的信息，以便叠加在放大图像获取步骤中获取的放大图像上。 根据本发明的观察方法可以获得具有高灵敏度和高分辨率的样品中的晶体结构的信息。

公开(公告)号：US20020099573A1

公开(公告)日：2002-07-25

申请号：US10046972

申请日：2002-01-17

Applicant: Hitachi, Ltd.

Inventor： Masanari Koguchi ,  Ruriko Tsuneta ,  Koji Aramaki ,  Kaoru Umemura

IPC: G06F017/60

CPC classification number: G06Q10/10 ,  G06Q30/02 ,  G06Q50/24

Abstract: The present invention provides a solution business for serving high speed and diversified analysis work/result and apparatus maintenance, and provides a function to control the apparatus of a customer and analysis organization with a common command through a network. The analysis organization provides the work involving high level operation and apparatus maintenance, and the interpretation and analysis of the acquired data. The customer participates to the analysis work on line through the video conference. The charge system corresponding to the analysis apparatus and operation content is set in a host computer of the network, the charge is presented to the customer on line as the analysis work proceeds, and the final cost is collected through a bank. Furthermore, the host computer is provided with a library function that stores the past data and literatures for viewing.

Abstract translation: 本发明提供了一种解决方案，用于服务于高速和多样化的分析工作/结果和设备维护，并提供了通过网络以公共命令来控制客户和分析组织的设备的功能。 分析组织提供涉及高层次运作和设备维护的工作，并对所获得的数据进行了解释和分析。 客户通过视频会议参与分析工作。 对应于分析装置和操作内容的计费系统设置在网络的主计算机中，随着分析工作的进行，费用向客户呈现，最终成本通过银行收集。 此外，主计算机具有库函数，存储过去的数据和用于观看的文献。