Inspection Device and Inspection Method
    1.
    发明申请
    Inspection Device and Inspection Method 有权
    检验装置及检验方法

    公开(公告)号:US20140225606A1

    公开(公告)日:2014-08-14

    申请号:US14177965

    申请日:2014-02-11

    Applicant: Hitachi, Ltd.

    Abstract: Provided are an inspection device and an inspection method capable of achieving improved magnetic field sensitivity by using a magnetic thin film of a small film thickness. A light-emitting unit 1 emits light of a first wavelength for acquiring magnetic field inspection information and a second wavelength for acquiring inspection object surface information. A selection unit 6 selects information from an inspection object 4 and information from a magnetophotonic crystal film 3 acquired by light irradiation performed by an irradiation unit 2. An image generation unit 9 generates image data based on the magnetic field inspection information acquired with the first wavelength and the inspection object surface information acquired with the second wavelength selected by the selection unit. Each of the generated image data is displayed on a display unit 10.

    Abstract translation: 提供能够通过使用薄膜厚度的磁性薄膜来实现提高的磁场灵敏度的检查装置和检查方法。 发光单元1发射用于获取磁场检查信息的第一波长的光和用于获取检查对象表面信息的第二波长。 选择单元6从检查对象4中选择信息和通过照射单元2进行的光照射而获得的来自磁光子晶体膜3的信息。图像生成单元9基于以第一波长获取的磁场检查信息来生成图像数据 以及由选择单元选择的用第二波长获取的检查对象面信息。 所生成的图像数据中的每一个显示在显示单元10上。

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