公开(公告)号：US20130008466A1

公开(公告)日：2013-01-10

申请号：US13541938

申请日：2012-07-05

申请人： Hasan-Özkan KARAGÖZ ,  Michael LITTMANN ,  Thilo KRÄTSCHMER

发明人： Hasan-Özkan KARAGÖZ ,  Michael LITTMANN ,  Thilo KRÄTSCHMER

IPC分类号： B08B1/04

CPC分类号： G01N21/15 ,  G01N2021/152

摘要： An apparatus and method for cleaning deposits and accretions from an end plate of a sensor body, for accommodating a measuring apparatus for determining one or more physical and/or chemical, process variables. The sensor body is sealed against penetration by liquid and a wiper is provided having a wiper blade for cleaning the end plate. The wiper is arranged as a subcomponent on a peripheral, appended module, wherein geometries of the wiper and the peripheral, appended module are so embodied that the wiper in the case of rotary movement from a rest position into a cleaning position, with the lower edge of the wiper blade being flush with the upper edge of the end plate, in the cleaning position, and in order that the wiper cleans the end plate by contact of the wiper blade with the end plate, and the wiper then returns to the rest position.

摘要翻译： 一种用于从传感器主体的端板清洁沉积物和附着物的装置和方法，用于容纳用于确定一个或多个物理和/或化学过程变量的测量装置。 传感器体被密封以防止液体渗透，并且设有具有用于清洁端板的刮水片的刮水器。 擦拭器被布置为周边附加模块上的子部件，其中擦拭器和外围附加模块的几何形状被实施为使得在从静止位置旋转移动到清洁位置的情况下的刮水器与下边缘 在清洁位置上，刮水器与顶板的上边缘齐平，并且为了使刮水器通过雨刮器与端板的接触来清洁端板，并且雨刷器返回到静止位置 。