Adjusting fabrication of integrated computational elements
    1.
    发明授权
    Adjusting fabrication of integrated computational elements 有权
    调整集成计算元素的制作

    公开(公告)号:US09495505B2

    公开(公告)日:2016-11-15

    申请号:US14390971

    申请日:2013-12-24

    Abstract: Techniques include receiving a design of an integrated computational element (ICE) including (1) specification of a substrate and multiple layers, their respective target thicknesses and refractive indices, adjacent layer refractive indices being different from each other, and a notional ICE fabricated based on the ICE design being related to a characteristic of a sample, and (2) indication of target ICE performance; forming one or more of the layers of an ICE based on the ICE design; in response to determining that an ICE performance would not meet the target performance if the ICE having the formed layers were completed based on the received ICE design, updating the ICE design to a new total number of layers and new target layer thicknesses, such that performance of the ICE completed based on the updated ICE design meets the target performance; and forming some of subsequent layers based on the updated ICE design.

    Abstract translation: 技术包括接收集成计算元件(ICE)的设计,包括(1)衬底和多层的规格,它们各自的目标厚度和折射率,相邻层折射率彼此不同,以及基于 ICE设计与样本的特征有关,(2)目标ICE表现的指示; 基于ICE设计形成ICE的一个或多个层; 响应于确定如果基于接收到的ICE设计完成了具有形成层的ICE,则ICE性能将不会满足目标性能,则将ICE设计更新为新的总层数和新的目标层厚度,使得性能 基于更新的ICE设计完成的ICE符合目标性能; 并基于更新的ICE设计形成一些后续层。

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