SEMICONDUCTOR CIRCUIT PATTERN MEASURING APPARATUS AND METHOD
    1.
    发明申请
    SEMICONDUCTOR CIRCUIT PATTERN MEASURING APPARATUS AND METHOD 有权
    半导体电路图形测量装置及方法

    公开(公告)号:US20140003703A1

    公开(公告)日:2014-01-02

    申请号:US13868352

    申请日:2013-04-23

    IPC分类号: G06T7/00

    摘要: Included is a multiple resolution image generating unit which applies a plurality of noise removing filters to a semiconductor circuit pattern image and generates a multiple resolution image, a multiple resolution differential image generating unit which generates a multiple resolution differential image from a difference of images between hierarchies of the multiple resolution image, and a contour extracting unit which extracts a contour of the semiconductor circuit pattern based on an intensity signal of the semiconductor circuit pattern image. The contour extracting unit calculates an intensity signal level upon extracting a contour of the semiconductor circuit pattern from the multiple resolution image by using an image signal of the multiple resolution differential image, and extracts a contour of the semiconductor circuit pattern based on the calculated intensity signal level.

    摘要翻译: 包括多分辨率图像生成单元,其对半导体电路图案图像应用多个噪声去除滤波器并生成多分辨率图像;多分辨率差分图像生成单元,其从层级之间的图像的差异生成多分辨率差分图像 以及轮廓提取单元,其基于半导体电路图案图像的强度信号提取半导体电路图案的轮廓。 轮廓提取单元通过使用多分辨率差分图像的图像信号从多分辨率图像提取半导体电路图案的轮廓来计算强度信号电平,并且基于计算出的强度信号提取半导体电路图案的轮廓 水平。