GRATING PATTERNS FOR TARGET PHASE CHANGES
    1.
    发明申请
    GRATING PATTERNS FOR TARGET PHASE CHANGES 审中-公开
    目标相位变化的格局

    公开(公告)号:US20160341855A1

    公开(公告)日:2016-11-24

    申请号:US15224417

    申请日:2016-07-29

    摘要: Examples include a method for fabricating a grating mirror using a computing device that comprises calculating a target phase change across the grating mirror. The target phase change may correspond to a target wavefront shape in a beam of light reflected from a grating patter. The method may also comprise generating the grating pattern comprising a plurality of lines with line widths, line period spacings, and line thicknesses corresponding to the target phase change across the grating mirror using the computing device. In such examples, a set of coordinates may be generated using the computing device with each coordinate identifying a location of a line of the plurality of lines, a line width of the line, a line period spacing of the line, and a line thickness of the line.

    摘要翻译: 示例包括使用计算设备制造光栅镜的方法,该方法包括计算横跨光栅镜的目标相位变化。 目标相位变化可以对应于从光栅图案反射的光束中的目标波前形状。 该方法还可以包括使用计算设备生成包括具有线宽,线周期间隔和对应于穿过光栅镜的目标相位变化的线厚度的多条线的光栅图案。 在这样的示例中,可以使用计算设备生成一组坐标,其中每个坐标标识多条线的线的位置,线的线宽,线的行周期间隔和线的厚度 线。