公开(公告)号：US20240044019A1

公开(公告)日：2024-02-08

申请号：US18255895

申请日：2021-12-06

Applicant: HELIOS PROJECT LTD

Inventor： Jonathan HAUSNER ,  Jonathan GEIFMAN ,  Linoam ELIAD ,  Yossi GOFER ,  Oran LORI

IPC: C25B1/33 ,  C25B15/021 ,  C25B9/09

CPC classification number: C25B1/33 ,  C25B15/021 ,  C25B9/09

Abstract: It is the object of the present invention to present a method of producing silicon, characterized by mixing silicon dioxide and at least one metal oxide at an elevated temperate wherein said oxide and silicon form a eutectic mixture or eutectic system.