-
公开(公告)号:US20210061667A1
公开(公告)日:2021-03-04
申请号:US16644583
申请日:2018-09-05
Applicant: FUSO CHEMICAL CO., LTD.
Inventor: Kazui Omokawa , Hirokazu Yokota , Kenichi Takeuchi , Yuma Negishi , Tomoko Kiseki , Munenori Komoto
IPC: C01B33/159 , C01B33/152 , G03G9/097
Abstract: Provided is a hydrophobic silica powder that can be obtained by the sol-gel process, and that is excellent in charge properties. The hydrophobic silica powder has a hydrophobicity of 50% or more, a saturated water content of 4% or less, and a nitrogen content of 0.05% or more.
-
公开(公告)号:US11691885B2
公开(公告)日:2023-07-04
申请号:US16644583
申请日:2018-09-05
Applicant: FUSO CHEMICAL CO., LTD.
Inventor: Kazui Omokawa , Hirokazu Yokota , Kenichi Takeuchi , Yuma Negishi , Tomoko Kiseki , Munenori Komoto
IPC: C01B33/159 , C01B33/152 , G03G9/097
CPC classification number: C01B33/159 , C01B33/152 , G03G9/09725 , C01P2002/86 , C01P2006/82
Abstract: Provided is a hydrophobic silica powder that can be obtained by the sol-gel process, and that is excellent in charge properties. The hydrophobic silica powder has a hydrophobicity of 50% or more, a saturated water content of 4% or less, and a nitrogen content of 0.05% or more.
-
公开(公告)号:US20220177318A1
公开(公告)日:2022-06-09
申请号:US17436335
申请日:2020-02-26
Applicant: FUSO CHEMICAL CO., LTD.
Inventor: Hideki Otsuki , Yoshiki Michiwaki , Yuma Negishi , Toshiki Chiba
IPC: C01B33/141
Abstract: The present invention provides colloidal silica that exhibits excellent abrasiveness and contains, with high purity, deformed silica particles with excellent compactness and a large amount of alkoxy groups per unit area; the invention also provides a method for producing the colloidal silica in a simple manner with reduced costs. The invention provides colloidal silica containing silica particles having a bent structure and/or a branched structure, wherein the silica particles have a particle density of 1.95 or more, the silica particles have a ratio (m/n) of the content of alkoxy groups m (ppa) to the average primary particle size n (nm) of 200 or more, and the silica particles having a bent structure and/or a branched structure are present in an amount of 15% or more based on the number of particles in a given field of view as observed with a scanning electron microscope at 200,000-times magnification.
-
公开(公告)号:US20220144649A1
公开(公告)日:2022-05-12
申请号:US17436126
申请日:2020-02-26
Applicant: FUSO CHEMICAL CO., LTD.
Inventor: Yuma Negishi , Hideki Otsuki , Hiroaki Yamashita , Toshiki Chiba
IPC: C01B33/145
Abstract: A colloidal silica is disclosed that contains, with high purity, silica particles having an appropriate particle density, a high aggregation ratio, and a high alkoxy group content, and to provide a method for producing the colloidal silica in a simple manner at reduced costs. The colloidal silica containing silica particles is disclosed, wherein the silica particles have an average primary particle size of 33 nm or more, an aggregation ratio of 1.2 or more, and a particle density of 1.95 or more, the silica particles contain 1000 ppm by mass or more of alkoxy groups per gram of the silica particles, the proportion of the number of silica particles having an equivalent circle diameter under 20 nm is less than 15%, and the silica particles contain a primary amine in an amount of 5 μmol or more per gram of the silica particles.
-
公开(公告)号:US20220128914A1
公开(公告)日:2022-04-28
申请号:US17436143
申请日:2020-02-26
Applicant: FUSO CHEMICAL CO., LTD.
Inventor: Kazui Omokawa , Yuma Negishi , Yasuhiro Fuma
IPC: G03G9/08
Abstract: The present invention provides a hydrophobic silica powder having a small particle size, a narrow particle size distribution, and a high hydrophobicity, and containing a very small amount of organic acid, and toner resin particles having the hydrophobic silica powder on the surface thereof. A hydrophobic silica powder having a particle size (D50) as measured by a laser diffraction method of 300 nm or less, a particle size distribution index (D90/D10) of 3.0 or less, a hydrophobicity of 60% by volume or more, and an organic acid content of 1 to 300 ppm.
-
-
-
-