公开(公告)号：US20250102451A1

公开(公告)日：2025-03-27

申请号：US18475637

申请日：2023-09-27

Applicant: FEI Company

Inventor： Vojtech MAHEL ,  Branislav STRAKA ,  Libor NOVÁK ,  Jeremy GRAHAM

IPC: G01N23/2251 ,  G01N23/203

Abstract: Dual beam charged particle microscopy systems, sensors, and techniques are disclosed. A charged particle microscope system can include a vacuum chamber, a sample stage disposed in the vacuum chamber, a first beam source operable to direct a first particle beam into the vacuum chamber, a second beam source operable to direct a second particle beam into the vacuum chamber, a first charged particle sensor, and a second charged particle sensor. The first charged particle sensor can include a detector cell having a semiconductor layer characterized by a bandgap equal to or greater than about 2.0 eV, oriented to detect secondary electrons generated based on an interaction between the first particle beam or the second particle beam and the sample. The second charged particle sensor can include a scintillator detector configured to be saturated from electrons generated based on an interaction between the second particle beam and the sample.