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公开(公告)号:US10153141B2
公开(公告)日:2018-12-11
申请号:US14621739
申请日:2015-02-13
Inventor: Sun Jin Yun , Kyu Sung Lee , JungWook Lim
Abstract: Provided is an apparatus for monitoring a gas and plasma process equipment including the same. The apparatus includes: a housing including a gas inflow hole, a gas discharge hole, and windows; a light source disposed adjacent to one of the windows outside the housing to provide source light to a gas supplied between the gas inflow hole and the gas discharge hole; a sensor disposed adjacent to the other of the windows outside the housing to detect fluorescence emitted from the gas by the source light; and a coil disposed in the housing between the gas inflow hole and the gas discharge hole to heat and decompose the gas between the light source and the sensor, thereby increasing the fluorescence emitted from the gas.
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公开(公告)号:US11192300B2
公开(公告)日:2021-12-07
申请号:US16788413
申请日:2020-02-12
Inventor: Ji-Young Oh , Yong Suk Yang , Kyung Hyun Kim , Kyu Sung Lee
IPC: B29C64/209 , B29C64/171 , B29C64/165 , B29C64/241 , B29C64/106 , B33Y30/00 , B33Y10/00 , B29C64/159 , B29C64/321 , B29C64/236
Abstract: Disclosed are a system for and a method of manufacturing a three-dimensional (3D) structure. The method may include injecting a fluid with a first pressure toward a surface of a first output layer to form a softening layer in the first output layer, injecting the fluid with a second pressure toward the softening layer to form an uneven structure in the softening layer, the second pressure being higher than the first pressure, and forming a second output layer on the softening layer with the uneven structure.
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