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公开(公告)号:US20250072019A1
公开(公告)日:2025-02-27
申请号:US18770484
申请日:2024-07-11
Inventor: Jun Hwan SHIN , Young Ho Kim , Eui Su Lee , Jin Chul Cho , Soo Cheol Kang , Dong Woo Park , II Min Lee
IPC: H01L29/872 , H01L29/06 , H01L29/20 , H01L29/66
Abstract: Disclosed herein are a Schottky barrier diode (SBD) and a method of manufacturing the same. The SBD includes a substrate, an ohmic layer formed on a portion of an upper portion of the substrate, a Schottky layer formed on a portion of an upper portion of the ohmic layer, an insulating layer formed on a portion of the upper portion of the ohmic layer, a low-k material layer formed on a portion of the upper portion of the substrate, and a Schottky metal layer formed on portions of upper portions of the low-k material layer and the insulating layer.