公开(公告)号：US20240100602A1

公开(公告)日：2024-03-28

申请号：US18264802

申请日：2022-02-04

申请人： EBARA CORPORATION

发明人： Junki ASAI

IPC分类号： B22F12/55 ,  B22F12/00 ,  B22F12/52 ,  B22F12/53 ,  B22F12/70 ,  B22F12/90 ,  B33Y30/00 ,  B33Y50/02

CPC分类号： B22F12/55 ,  B22F12/222 ,  B22F12/224 ,  B22F12/52 ,  B22F12/53 ,  B22F12/70 ,  B22F12/90 ,  B33Y30/00 ,  B33Y50/02

摘要： The present disclosure provides a structure for replenishing a powder material to a material supply device during fabrication using the AM technique. According to one aspect, an AM apparatus is provided. This AM apparatus includes a DED nozzle configured to eject a powder material, a gantry mechanism configured to move the DED nozzle, and a powder supply device configured to supply the powder material to the DED nozzle. The gantry mechanism includes a Y-axis member movable in a horizontal X direction and extending in a horizontal Y direction perpendicular to the X direction. The DED nozzle and the material supply device are mounted on the Y-axis member of the gantry mechanism. The gantry mechanism includes a Y-axis movement mechanism for moving the DED nozzle and the material supply device along the Y direction on the Y-axis member.

公开(公告)号：US20240001448A1

公开(公告)日：2024-01-04

申请号：US18248091

申请日：2021-09-14

申请人： EBARA CORPORATION

发明人： Hiroyuki SHINOZAKI ,  Junki ASAI ,  Yoshitaka MUKAIYAMA

IPC分类号： B22F12/00 ,  B22F10/28 ,  B22F10/322 ,  B22F12/70 ,  B33Y30/00

CPC分类号： B22F12/38 ,  B22F10/28 ,  B22F10/322 ,  B22F12/70 ,  B33Y30/00

摘要： The present invention constructs, in an AM system, such an environment that fine particles are prevented from scattering from an area where the fine particles such as a powder material can be present to another area. According to one aspect, an AM system configured to manufacture a fabrication object is provided. This AM system includes a fabrication chamber in which an AM apparatus is disposed, and a buffer chamber in communication with the fabrication chamber. The buffer chamber includes an entrance in communication with a surrounding environment, an exit in communication with the fabrication chamber, a grating floor, and an exhaust port. The AM system further includes a first gate configured to be able to open and close the entrance of the buffer chamber, and a second gate configured to be able to open and close the exit of the buffer chamber.

公开(公告)号：US20230398605A1

公开(公告)日：2023-12-14

申请号：US18247755

申请日：2021-09-14

申请人： EBARA CORPORATION

发明人： Hiroyuki SHINOZAKI ,  Junki ASAI

IPC分类号： B22F12/52 ,  B33Y30/00 ,  B22F12/53 ,  B23K26/342

CPC分类号： B22F12/52 ,  B33Y30/00 ,  B22F12/53 ,  B23K26/342

摘要： The present invention provides a powder supply apparatus. According to one aspect, a powder supply apparatus is provided. The powder supply apparatus includes a container configured to store powder therein, a supply passage configured to supply the powder to the container therethrough, and a valve mechanism configured to open and close the supply passage thereby. The valve mechanism includes a valve main body movable between a first position, at which the valve main body closes the supply passage, and a second position, at which the valve main body opens the supply passage, and further includes a valve seat configured in such a manner that the valve main body is seated thereon. The valve main body includes a first seal portion and a second seal portion. The valve seat includes a first seat portion on which the first seal portion is seated, and a second seat portion on which the second seal portion is seated. The valve mechanism defines a space sealingly closed when the first seal portion is seated on the first seat portion and the second seal portion is seated on the second seat portion. The valve mechanism includes an exhaust passage configured to exhaust gas from the sealingly closed space therethrough and a pressure monitoring passage configured to be used to monitor a pressure in the sealingly closed space.