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Patent Agency Ranking
公开(公告)号：US10796876B2
公开(公告)日：2020-10-06
申请号：US15983967
申请日：2018-05-18
Inventor： Bao Gia Nguyen , John D. Williams , Desiree D. Williams , Casey C. Farnell , Ryan Kenneth Ham , Kathryn Elizabeth Greiner
IPC: H01J29/48 , H01J9/04 , H01J37/02 , B33Y40/00 , H05H1/48 , H01J1/28 , H01J37/065 , B33Y30/00 , H01J29/04 , H01J3/02 , B22F3/105 , H01J27/20
Abstract: A filament assembly can include: a button having a planar emitter region with one or more apertures extending from an emission surface of the planar emitter region to an internal surface opposite of the emission surface; an inlet electrical lead coupled to the button at a first side; an outlet electrical lead coupled to the button at a second side opposite of the first side; and a low work function object positioned adjacent to the internal surface of the planar emitter region and retained to the button. The planar emitter region can include a plurality of apertures. The low work function object can include a porous ceramic material having the barium, and may have a polished external surface. An electron gun can include the filament assembly. An additive manufacturing system can include the electron gun having the filament assembly.
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公开(公告)号：US10269526B2
公开(公告)日：2019-04-23
申请号：US15901763
申请日：2018-02-21
Inventor： Rafael A. Martinez , John D. Williams , Joel A. Moritz, Jr. , Casey C. Farnell
Abstract: A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas distributor, an instant-start hollow cathode mounted to the plasma source, and an externally mounted keeper, is described. The apparatus offers advantages over existing other Hall current plasma sources having similar power levels, including: lower mass, longer lifetime, lower part count including fewer power supplies, and the ability to be continuously adjustable to lower average power levels using pulsed operation and adjustment of the pulse duty cycle. The Hall current plasma source can provide propulsion for small spacecraft that either do not have sufficient power to accommodate a propulsion system or do not have available volume to incorporate the larger propulsion systems currently available. The present low-power Hall current plasma source can be used to provide energetic ions to assist the deposition of thin films in plasma processing applications.
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公开(公告)号：US09934929B1
公开(公告)日：2018-04-03
申请号：US15424385
申请日：2017-02-03
Inventor： Rafael A. Martinez , John D. Williams , Joel A. Moritz, Jr. , Casey C. Farnell
CPC classification number: H01J27/146 , F03H1/0075 , H01J27/143
Abstract: A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas distributor, an instant-start hollow cathode mounted to the plasma source, and an externally mounted keeper, is described. The apparatus offers advantages over other Hall current plasma sources having similar power levels, including: lower mass, longer lifetime, lower part count including fewer power supplies, and the ability to be continuously adjustable to lower average power levels using pulsed operation and adjustment of the pulse duty cycle. The Hall current plasma source can provide propulsion for small spacecraft that either do not have sufficient power to accommodate a propulsion system or do not have available volume to incorporate the larger propulsion systems currently available. The present low-power Hall current plasma source can be used to provide energetic ions to assist the deposition of thin films in plasma processing applications.
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公开(公告)号：US20180269024A1
公开(公告)日：2018-09-20
申请号：US15983967
申请日：2018-05-18
Inventor： Bao Gia Nguyen , John D. Williams , Desiree D. Williams , Casey C. Farnell , Ryan Kenneth Ham , Kathryn Elizabeth Greiner
Abstract: A filament assembly can include: a button having a planar emitter region with one or more apertures extending from an emission surface of the planar emitter region to an internal surface opposite of the emission surface; an inlet electrical lead coupled to the button at a first side; an outlet electrical lead coupled to the button at a second side opposite of the first side; and a low work function object positioned adjacent to the internal surface of the planar emitter region and retained to the button. The planar emitter region can include a plurality of apertures. The low work function object can include a porous ceramic material having the barium, and may have a polished external surface. An electron gun can include the filament assembly. An additive manufacturing system can include the electron gun having the filament assembly.
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5.发明申请公开(公告)号：US20180226217A1
公开(公告)日：2018-08-09
申请号：US15901763
申请日：2018-02-21
Inventor： Rafael A. Martinez , John D. Williams , Joel A. Moritz, JR. , Casey C. Farnell
CPC classification number: H01J27/146 , F03H1/0075 , H01J27/143
Abstract: A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas distributor, an instant-start hollow cathode mounted to the plasma source, and an externally mounted keeper, is described. The apparatus offers advantages over existing other Hall current plasma sources having similar power levels, including: lower mass, longer lifetime, lower part count including fewer power supplies, and the ability to be continuously adjustable to lower average power levels using pulsed operation and adjustment of the pulse duty cycle. The Hall current plasma source can provide propulsion for small spacecraft that either do not have sufficient power to accommodate a propulsion system or do not have available volume to incorporate the larger propulsion systems currently available. The present low-power Hall current plasma source can be used to provide energetic ions to assist the deposition of thin films in plasma processing applications.
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