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公开(公告)号:US06795746B2
公开(公告)日:2004-09-21
申请号:US09815998
申请日:2001-03-22
Applicant: Chun-Min Chuang , I-Liang Lin , Chun-Kuang Lin , Yung-I Yeh
Inventor: Chun-Min Chuang , I-Liang Lin , Chun-Kuang Lin , Yung-I Yeh
IPC: G06F1900
CPC classification number: G06F17/5068
Abstract: The internet bonding diagram system comprises a processing unit to process the information send by a user via a network. A blank lead frame/substrate database is coupled to the processing unit to store lead frame information. A job database is coupled to the processing unit to store information forwarded by a potential client, wherein the job database includes buyer satisfaction data provided by said user. A bonding diagram generator is coupled to the processing unit to generate a layout of bonding diagram in accordance with the information provided by the user. A forwarding module is responsive to the bonding diagram generator to forward the layout of bonding diagram to the user.
Abstract translation: 互联网绑定图系统包括处理单元,用于处理由用户通过网络发送的信息。 空白引线框架/衬底数据库耦合到处理单元以存储引线框架信息。 作业数据库被耦合到处理单元以存储由潜在客户端转发的信息,其中作业数据库包括由所述用户提供的买方满意度数据。 接合图生成器耦合到处理单元,以根据用户提供的信息生成结合图的布局。 转发模块响应于绑定图生成器将绑定图的布局转发给用户。
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公开(公告)号:US20090276750A1
公开(公告)日:2009-11-05
申请号:US12198121
申请日:2008-08-26
Applicant: Chun-Yu Lin , Chia-Jung Liou , Cheng-Hung Ku , Feng-Yuan Chiu , Chun-Kuang Lin , Chih-Chiang Huang
Inventor: Chun-Yu Lin , Chia-Jung Liou , Cheng-Hung Ku , Feng-Yuan Chiu , Chun-Kuang Lin , Chih-Chiang Huang
IPC: G06F17/50
Abstract: A method for establishing a scattering bar rule for a mask pattern for fabricating a device is provided. The method is described as follows. First, at least one image simulation model is established according to the mask pattern and a process reference set used for fabricating the device based on the mask pattern. Next, a plurality of scattering bar reference sets is applied to the image simulation model so as to generate a plurality of simulation images, respectively. Further, a portion of the simulation images are selected to be a plurality of candidate layouts according to a screening criterion. Next, one of the candidate layouts is determined to be a pattern layout according to a selection rule, and the scattering bar reference set corresponding to the pattern layout is determined to be a scattering bar rule of the mask pattern.
Abstract translation: 提供了一种用于建立用于制造器件的掩模图案的散射线规则的方法。 该方法描述如下。 首先,根据掩模图案建立至少一个图像模拟模型,以及基于掩模图案用于制造该装置的工艺参考组。 接下来,将多个散射条参考集合应用于图像模拟模型,以分别生成多个模拟图像。 此外,根据筛选标准,将模拟图像的一部分选择为多个候选布局。 接下来,根据选择规则将候选布局之一确定为图案布局,并且将与图案布局相对应的散射条参考集确定为掩模图案的散射条规则。
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公开(公告)号:US06730051B2
公开(公告)日:2004-05-04
申请号:US10056624
申请日:2002-01-28
Applicant: Chun-Kuang Lin
Inventor: Chun-Kuang Lin
IPC: A61H700
CPC classification number: A61H33/6057 , A61H9/0071 , A61H23/04 , A61H33/6036 , A61H33/6047 , A61H33/6089
Abstract: A rotating and vibrating massage shower nozzle comprised of a first transmission shaft and a flexible transmission cable. The first transmission shaft rotates a drive gear, a driven gear, and a second transmission shaft. The second transmission shaft has a drive ring gear installed on it that impels a bevel gear train or an eccentric cylinder, with the bevel gear train controlling the revolution of a rotary output coupling such that a bathing accessory mounted on it is spun and the imbalanced action of the eccentric cylinder effectively generates vibrations for massage applications.
Abstract translation: 旋转和振动的按摩淋浴喷头由第一传动轴和柔性传动电缆组成。 第一传动轴旋转驱动齿轮,从动齿轮和第二传动轴。 第二传动轴具有安装在其上的驱动环齿轮,其推动锥齿轮系或偏心圆筒,锥齿轮系控制旋转输出联轴器的旋转,使得安装在其上的洗澡配件被旋转,并且不平衡动作 的偏心圆柱体有效地产生用于按摩应用的振动。
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公开(公告)号:US08103978B2
公开(公告)日:2012-01-24
申请号:US12198121
申请日:2008-08-26
Applicant: Chun-Yu Lin , Chia-Jung Liou , Cheng-Hung Ku , Feng-Yuan Chiu , Chun-Kuang Lin , Chih-Chiang Huang
Inventor: Chun-Yu Lin , Chia-Jung Liou , Cheng-Hung Ku , Feng-Yuan Chiu , Chun-Kuang Lin , Chih-Chiang Huang
IPC: G06F17/50
Abstract: A method for establishing a scattering bar rule for a mask pattern for fabricating a device is provided. The method is described as follows. First, at least one image simulation model is established according to the mask pattern and a process reference set used for fabricating the device based on the mask pattern. Next, a plurality of scattering bar reference sets is applied to the image simulation model so as to generate a plurality of simulation images, respectively. Further, a portion of the simulation images are selected to be a plurality of candidate layouts according to a screening criterion. Next, one of the candidate layouts is determined to be a pattern layout according to a selection rule, and the scattering bar reference set corresponding to the pattern layout is determined to be a scattering bar rule of the mask pattern.
Abstract translation: 提供了一种用于建立用于制造器件的掩模图案的散射线规则的方法。 该方法描述如下。 首先,根据掩模图案建立至少一个图像模拟模型,以及基于掩模图案用于制造该装置的工艺参考组。 接下来,将多个散射条参考集合应用于图像模拟模型,以分别生成多个模拟图像。 此外,根据筛选标准,将模拟图像的一部分选择为多个候选布局。 接下来,根据选择规则将候选布局之一确定为图案布局,并且将与图案布局相对应的散射条参考集确定为掩模图案的散射条规则。
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