公开(公告)号：US09691641B2

公开(公告)日：2017-06-27

申请号：US13713007

申请日：2012-12-13

申请人： Chia-Hung Huang ,  Jeng-Jyi Hwang ,  Chi-Ming Yang

发明人： Chia-Hung Huang ,  Jeng-Jyi Hwang ,  Chi-Ming Yang

IPC分类号： B08B3/04 ,  H01L21/67 ,  C11D11/00 ,  H01L21/687

CPC分类号： H01L21/67051 ,  B08B3/04 ,  C11D11/0047 ,  H01L21/68764 ,  H01L21/68771

摘要： An apparatus for cleaning wafers includes a chamber, a rotatable substrate holder inside the chamber, a nozzle above the rotatable substrate holder, a cover facing downward and fluidly coupled with the nozzle. The rotatable substrate holder is configured to mount one or more semiconductor wafers on the rotatable substrate holder. The nozzle is configured to spray a cleaning medium onto the one or more semiconductor wafers. The cover is of a shape having a top edge with a top cross-sectional area and a bottom edge with a bottom cross-sectional area.

公开(公告)号：US20140095083A1

公开(公告)日：2014-04-03

申请号：US13632530

申请日：2012-10-01

申请人： Tzu-Sou Chuang ,  Jeng-Jyi Hwang ,  Cheng-Lung Chou ,  Chi-Ming Yang ,  Chin-Hsiang Lin

发明人： Tzu-Sou Chuang ,  Jeng-Jyi Hwang ,  Cheng-Lung Chou ,  Chi-Ming Yang ,  Chin-Hsiang Lin

IPC分类号： G01N33/00 ,  G06F15/00

CPC分类号： G01N33/0004 ,  G06F15/00

摘要： The present disclosure provides a method of identifying an airborne molecular contamination (AMC) leaking source in a fab. The method includes distributing a sensor in the fab, executing a forward computational fluid dynamics (CFD) simulation of an air flow in the fab, setting an inversed modeling of the forward CFD simulation of the air flow in the fab, building up a database of a spatial response probability distribution matrix of the sensor using an AMC measurement data in the fab, and identifying the AMC leaking source using the database of the spatial response probability distribution matrix of the sensor.

摘要翻译： 本公开提供了一种在晶圆厂中识别空气传播分子污染（AMC）泄漏源的方法。 该方法包括在晶圆厂中分布传感器，对晶圆厂中的空气流进行前向计算流体动力学（CFD）仿真，设置晶圆厂中空气流的前向CFD模拟的反向建模，建立数据库 使用工厂中的AMC测量数据的传感器的空间响应概率分布矩阵，以及使用传感器的空间响应概率分布矩阵的数据库来识别AMC泄漏源。