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公开(公告)号：US20240295828A1
公开(公告)日：2024-09-05
申请号：US18587228
申请日：2024-02-26
申请人： Carl Zeiss SMT GmbH
IPC分类号： G03F7/00
CPC分类号： G03F7/7065 , G03F7/70033 , G03F7/7085
摘要： A method for inspecting photomasks, in which a photomask is illuminated by EUV radiation emitted by an EUV radiation source). EUV radiation reflected at the photomask is guided via a projection lens to an image sensor of an EUV camera such that the photomask is imaged on the image sensor. The EUV radiation passes through a pellicle which is arranged between the projection lens and the image sensor. The invention also relates to an EUV camera and to a measuring device for inspecting photomasks.
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2.发明公开公开(公告)号：US20240353768A1
公开(公告)日：2024-10-24
申请号：US18638890
申请日：2024-04-18
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/70983 , G03F1/84 , G03F7/70033 , G03F7/702 , G03F7/70833 , G03F7/70858
摘要： A measuring device for inspecting photomasks comprises an illumination system, a projection lens and an EUV image sensor. EUV radiation emitted by an EUV radiation source is guided via the illumination system to a photomask. EUV radiation reflected at the photomask is guided via the projection lens to the EUV image sensor such that the photomask is imaged on the EUV image sensor. The measuring device comprises a frame component part, the frame component part carrying a pellicle. The pellicle is arranged between the photomask and the projection lens such that the EUV radiation reflected at the photomask passes through the pellicle. The invention also relates to a method for inspecting photomasks.
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3.发明公开公开(公告)号：US20240353757A1
公开(公告)日：2024-10-24
申请号：US18639028
申请日：2024-04-18
申请人： Carl Zeiss SMT GmbH
IPC分类号： G03F7/00
CPC分类号： G03F7/70033 , G03F7/70733 , G03F7/70833 , G03F7/70975 , G03F7/70983
摘要： Measurement apparatus for the inspection of photomasks, comprising an EUV radiation source, an illumination system, a projection lens and an EUV image sensor. EUV radiation emitted by the EUV radiation source is guided via the illumination system to a photomask. EUV radiation reflected at the photomask is guided via the projection lens to the EUV image sensor such that the photomask is imaged on the EUV image sensor. A pellicle is arranged between the EUV radiation source and the illumination system, with the result that the EUV radiation passes through the pellicle between the EUV radiation source and the illumination system. The invention also relates to a method for inspecting photomasks.
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