公开(公告)号：US20240103381A1

公开(公告)日：2024-03-28

申请号：US18512298

申请日：2023-11-17

Applicant: Carl Zeiss SMT GmbH

Inventor： Klaus Gwosch ,  Pascal Heller ,  Matthias Manger ,  Andreas Koeniger

IPC: G03F7/00

CPC classification number: G03F7/70266 ,  G03F7/7085

Abstract: An optical apparatus for a lithography system has at least one optical element comprising an optical surface. The optical apparatus also has one or more actuators for deforming the optical surface. The optical element comprises a strain gauge device for determining the deformation of the optical surface. The gauge device comprises: a) at least one path length device for generating a measurement spectrum of a measurement radiation, wherein the path length device comprises a grating device for the measurement radiation and/or a resonator device for the measurement radiation; and/or b) at least one waveguide, wherein the at least one waveguide and/or the at least one grating device and/or the at least one resonator device are formed by the substrate element.