公开(公告)号：US20230160686A1

公开(公告)日：2023-05-25

申请号：US17981674

申请日：2022-11-07

Applicant: CORNING INCORPORATED

Inventor： Joshua Monroe Cobb ,  Steven James Van Kerkhove

IPC: G01B9/0209 ,  G01B9/02 ,  G01B11/30 ,  G01B11/24 ,  G02B27/10

CPC classification number: G01B9/0209 ,  G01B9/02041 ,  G01B11/30 ,  G01B11/2441 ,  G02B27/1006

Abstract: A low-coherence Fizeau interferometer includes a first beamsplitter, a test arm and a reference arm, the first beamsplitter splits light into a first portion of light directed to the test arm and a second portion of light directed to the reference arm, and an imaging arm comprising a first collimating lens, a flat reference surface, and a test element. The test arm focuses the first portion of light at a first focal point, such that a virtual image of the first focal point appears at a focal point of the test element. The reference arm focuses the second portion of light at a second focal point, the first collimating lens collimates the light that then reflects off the flat reference surface. The second beamsplitter directs the first portion of light to reflect off the test element. The reflection of the first and second portion of light form an interference pattern.

公开(公告)号：US20250164240A1

公开(公告)日：2025-05-22

申请号：US18945782

申请日：2024-11-13

Applicant: CORNING INCORPORATED

Inventor： Thomas James Dunn ,  Steven James Van Kerkhove

IPC: G01B11/30 ,  G03F7/00

Abstract: A method of determining a flatness of a substrate, the method including measuring a first flatness measurement of the substrate at a first orientation relative to a vertical direction, measuring a second flatness measurement of the substrate at a second orientation relative to the vertical direction, measuring a third flatness measurement of the substrate at a third orientation relative to a vertical direction, and measuring a fourth flatness measurement of the substrate at a fourth orientation relative to a vertical direction, each of the first orientation, the second orientation, the third orientation, and the fourth orientation being at a different orientation relative to the vertical direction. The method further including generating a first set of differences, fitting the first set of differences to respective orthogonal polynomials, and generating a true flatness of the substrate.