SUBSTRATE STRUCTURE AND METHOD FOR MANUFACTURING PATTERNED LAYER THEREON
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    发明申请
    SUBSTRATE STRUCTURE AND METHOD FOR MANUFACTURING PATTERNED LAYER THEREON 审中-公开
    基板结构及其制作方法

    公开(公告)号:US20070212526A1

    公开(公告)日:2007-09-13

    申请号:US11557856

    申请日:2006-11-08

    IPC分类号: B41M5/00

    CPC分类号: B41M3/003 Y10T428/24802

    摘要: A substrate structure includes a substrate and a plurality of banks formed on the substrate. A substrate structure includes a substrate and a plurality of banks formed on the substrate. The banks and the substrate cooperatively define a plurality of accommodating rooms. The accommodating rooms are configured for accommodating ink. A width W of the bank is a function of a height H of the bank. A plot of the function W=f (H) has at least one discontinuity point. A left hand limit at the at least one discontinuity point being greater than a right hand limit at the at least one discontinuity point.

    摘要翻译: 衬底结构包括衬底和形成在衬底上的多个堤。 衬底结构包括衬底和形成在衬底上的多个堤。 堤和基底协同地限定多个容纳室。 容纳室被配置为容纳墨水。 银行的宽度W是银行的高度H的函数。 函数W = f(H)的图具有至少一个不连续点。 所述至少一个不连续点处的左手极限大于所述至少一个不连续点处的右手极限。