GAS TREATMENT APPARATUS AND GAS TREATMENT METHOD

    公开(公告)号:US20240343573A1

    公开(公告)日:2024-10-17

    申请号:US18751487

    申请日:2024-06-24

    IPC分类号: C01B13/02 C25B1/02

    CPC分类号: C01B13/0203 C25B1/02

    摘要: Provided is a gas treatment apparatus comprising an active oxygen supply device and a gas flow path, wherein the gas treatment apparatus is characterized in that the active oxygen supply device includes a housing having at least one opening, and a predetermined plasma actuator and a predetermined ozone decomposition device inside the housing, the plasma actuator and the ozone decomposition device are disposed so that an induced flow containing active oxygen flows out of the housing through the opening, and the active oxygen supply device is disposed so as to allow the induced flow containing the active oxygen flowing out through the opening to be introduced into the gas flow path.