公开(公告)号：US20160148789A1

公开(公告)日：2016-05-26

申请号：US15012941

申请日：2016-02-02

申请人： BEIJING NMC CO., LTD

发明人： PENG CHEN ,  YOU LV ,  PEIJUN DING ,  JINGSHAN YANG ,  GUODONG BIAN ,  MENGXIN ZHAO ,  QING SHE ,  WEI LI

IPC分类号： H01J37/32

CPC分类号： H01J37/32871 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32495 ,  H01J37/32651 ,  H01J2237/335

摘要： The present disclosure provides a pre-cleaning chamber. The pre-cleaning chamber includes a cavity, a top cover of the cavity, and an ion filtering unit with venting holes. The ion filtering unit is configured to divide the cavity into an upper sub-cavity and a lower sub-cavity and to filter out ions from plasma when the plasma is moving through the filtering unit from the upper sub-cavity to the lower sub-cavity. The pre-cleaning chamber further includes a carry unit located in the lower sub-cavity for supporting a wafer.

摘要翻译： 本公开提供了一种预清洁室。 预清洁室包括空腔，空腔的顶盖以及具有排气孔的离子过滤单元。 离子过滤单元构造成将空腔分成上子腔和下子腔，并且当等离子体从上子腔到下子腔移动通过过滤单元时，将离子离子离子 。 预清洁室还包括位于下子腔中的承载单元，用于支撑晶片。