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    Composition for tin or tin alloy electroplating comprising suppressing agent
    1.
    发明授权
    Composition for tin or tin alloy electroplating comprising suppressing agent 有权

    公开(公告)号：US11840771B2

    公开(公告)日：2023-12-12

    申请号：US17566426

    申请日：2021-12-30

    Applicant: BASF SE

    Inventor： Alexander Fluegel ,  Marco Arnold ,  Nadine Engelhardt ,  Marcel Patrik Kienle

    IPC: C25D3/32 ,  C25D3/30

    CPC classification number: C25D3/32 ,  C25D3/30

    Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I






    wherein
    X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety,
    R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight,
    R11 is selected from H, R11, R40,
    R13, R14 are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13;
    X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be
    interrupted by O, S or NR43;
    R40 is H or a linear or branched C1-C20 alkyl,
    R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

    Composition for metal electroplating comprising leveling agent
    4.
    发明授权
    Composition for metal electroplating comprising leveling agent 有权

    公开(公告)号：US09758885B2

    公开(公告)日：2017-09-12

    申请号：US14438688

    申请日：2013-10-30

    Applicant: BASF SE

    Inventor： Marcel Patrik Kienle ,  Dieter Mayer ,  Cornelia Roeger-Goepfert ,  Alexandra Haag ,  Charlotte Emnet ,  Alexander Fluegel ,  Marco Arnold

    IPC: C25D3/56 ,  C25D3/58 ,  C25D3/00 ,  C25D3/38 ,  C25D3/32 ,  C23C18/38

    CPC classification number: C25D3/38 ,  C23C18/38 ,  C25D3/32

    Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant, wherein D6 is, for each repeating unit 1 to s independently, a divalent group selected from a saturated or unsaturated C1-C20 organic radical, D7 is, for each repeating unit 1 to s independently, a divalent group selected from straight chain or branched C2-C20 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, R1 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R2, may form a divalent group D8, and R2 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R1, may form a divalent group D8, and D8 is selected from straight chain or branched C1-C18 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, s is an integer from 1 to 250, R10 is selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl.

    COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
    7.
    发明申请
    COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT 有权
    包含水平试剂的金属电镀组合物

    公开(公告)号：US20150284865A1

    公开(公告)日：2015-10-08

    申请号：US14438688

    申请日：2013-10-30

    Applicant: BASF SE

    Inventor： Marcel Patrik Kienle ,  Dieter Mayer ,  Cornelia Roeger-Goepfert ,  Alexandra Haag ,  Charlotte Emnet ,  Alexander Fluegel ,  Marco Arnold

    IPC: C25D3/38 ,  C25D3/32

    CPC classification number: C25D3/38 ,  C23C18/38 ,  C25D3/32

    Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant,whereinD6 is, for each repeating unit 1 to s independently, a divalent group selected from a saturated or unsaturated C1-C20 organic radical,D7 is, for each repeating unit 1 to s independently, a divalent group selected from straight chain or branched C2-C20 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10,R1 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R2, may form a divalent group D8, andR2 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R1, may form a divalent group D8, andD8 is selected from straight chain or branched C1-C18 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10,s is an integer from 1 to 250,R10 is selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl.

    Abstract translation: 包含金属离子源和至少一种包含至少一种聚氨基酰胺的添加剂的组合物，所述聚氨基酰胺包括由式I表示的结构单元或通过完全或部分质子化获得的式I的聚氨基酰胺的衍生物，N-官能化或N- 用非芳香族反应物进行季铵化反应，其中D6为每个重复单元1独立地选自饱和或不饱和的C 1 -C 20有机基团的二价基团，D 7为每个重复单元1独立地为二价 选自直链或支链C 2 -C 20烷二基的基团，其可任选被杂原子或选自O，S和NR 10的二价基团中断，R 1为每个重复单元1至s独立地选自H，C 1 -C 20烷基 和可以任选被羟基，烷氧基或烷氧基羰基取代的C1-C20烯基，或者与R2一起可以形成二价基团D8，并且R2对于每个重复单元1至 独立地选自H，C 1 -C 20烷基和C 1 -C 20链烯基，其可以任选地被羟基，烷氧基或烷氧基羰基取代，或者与R 1一起可以形成二价基团D8，并且D8选自直链 或支链C 1 -C 18烷二基，其可任选被杂原子或选自O，S和NR 10的二价基团中断，s为1至250的整数，R 10选自H，C 1 -C 20烷基和C 1 -C 20链烯基 ，其可以任选地被羟基，烷氧基或烷氧基羰基取代。

    Composition for tin or tin alloy electroplating comprising suppressing agent
    9.
    发明授权
    Composition for tin or tin alloy electroplating comprising suppressing agent 有权

    公开(公告)号：US11459665B2

    公开(公告)日：2022-10-04

    申请号：US16954333

    申请日：2018-12-10

    Applicant: BASF SE

    Inventor： Alexander Fluegel ,  Marco Arnold ,  Marcel Patrik Kienle ,  Nadine Engelhardt

    IPC: C25D3/60 ,  C25D3/32 ,  C25D5/02 ,  C25D7/12

    Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I where X1, X2 are independently selected from a linear or branched C1-C12 alkanediyl, R11 is a monovalent group of formula —(O—CH2—CHR41)m—OR42, R12, R13, R14 are independently selected from H, R11, and R40; R15 is selected from H, R11, R40 and —X4—N(R21)2, X4 is a divalent group selected from (a) a linear or branched C1 to C12 alkanediyl, and (b) formula —(O—CH2—CHR41)o—, R21 is selected from R11 and R40, R40 is a linear or branched C1-C20 alkyl, R41 is selected from H and a linear or branched C1 to C5 alkyl, R42 is selected from H and a linear or branched C1-C20 alkyl, n is an integer of from 1 to 6, m is an integer of from 2 to 250, and o is an integer of from 1 to 250.

    Composition for tin or tin alloy electroplating comprising suppressing agent
    10.
    发明授权
    Composition for tin or tin alloy electroplating comprising suppressing agent 有权

    公开(公告)号：US11242606B2

    公开(公告)日：2022-02-08

    申请号：US17048770

    申请日：2019-04-11

    Applicant: BASF SE

    Inventor： Alexander Fluegel ,  Marco Arnold ,  Nadine Engelhardt ,  Marcel Patrik Kienle

    IPC: C25D3/32

    Abstract: The present invention provides an aqueous composition comprising tin ions and at least one compound of formula I wherein X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety, R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, R12 is selected from H, R11, R40, R13, R14, are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13; X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O, S or NR43; R40 is H or a linear or branched C1-C20 alkyl, R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

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