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公开(公告)号：US20250116512A1
公开(公告)日：2025-04-10
申请号：US18892499
申请日：2024-09-22
Applicant: Axcelis Technologies, Inc.
Inventor： Phillip Geissbühler , FHM Faridur Rahman , Neil Bassom
IPC: G01B11/30
Abstract: A light source directs an incident beam at a surface of the workpiece on a stage at an oblique angle. A detector images a diffraction pattern of the incident beam reflected off the workpiece. At least one of a twist angle and a tilt angle of the workpiece on the stage is determined based on the diffraction pattern. The workpiece may be a semiconductor wafer and the stage may be, for example, part of an ion implanter.
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