公开(公告)号：US11793103B2

公开(公告)日：2023-10-24

申请号：US16571244

申请日：2019-09-16

申请人： Applied Quantum Engeries, LLC

发明人： Benjamin Wolfe ,  George Paskalov ,  Rick Jarvis ,  Jerzy P. Puchacz

IPC分类号： H05H1/24 ,  A01C1/08 ,  A61L2/14 ,  H05H1/46 ,  A01C1/00 ,  H01J37/32 ,  A23B9/02 ,  A23B9/18

CPC分类号： A01C1/08 ,  A01C1/00 ,  A61L2/14 ,  H01J37/32 ,  H05H1/46 ,  A23B9/02 ,  A23B9/025 ,  A23B9/18 ,  A61L2202/16 ,  H05H1/466 ,  H05H2242/26

摘要： Methods and apparatuses to activate, modify, and sanitize the surfaces of granular, powdered, or seed material placed in a continuous flow of a low-temperature, reduced-pressure gas plasma. Said plasma may be created with radio-frequency power, using capacitive-inductive, or a combination of both types of discharge. The plasma is generated at pressures in the 0.01 to 10 Torr range. RF frequency ranges from 0.2 to 220 MHz, and correspond to a plasma density between about ne×108-ne×1012 or 0.001 to 0.4 W/cm3. Inserts and electrodes may be temperature controlled to control process conditions. RF discharge may be pulsed or modulated by different frequency in order to stimulate energy exchange between gas plasma and process material. The apparatuses may be grounded, biased and mechanically activated (e.g., vibration, rotation, etc.).

公开(公告)号：US11337375B2

公开(公告)日：2022-05-24

申请号：US16750510

申请日：2020-01-23

申请人： Applied Quantum Engeries, LLC

发明人： Benjamin Wolfe ,  George Paskalov ,  Rick Jarvis ,  Jerzy P. Puchacz

IPC分类号： A01G7/04 ,  A01C1/08 ,  B65G27/12 ,  B65G25/08

摘要： Methods and apparatuses to activate, modify, and sanitize the surfaces of granular, powdered, or seed material placed in a continuous flow of a low-temperature, reduced-pressure gas plasma. Said plasma may be created with radio-frequency power, using capacitive-inductive, or a combination of both types of discharge. The plasma is generated at pressures in the 0.01 to 10 Torr range. RF frequency ranges from 0.2 to 220 MHz, and correspond to a plasma density between about ne×108−ne×1012 or 0.001 to 0.4 W/cm3. Inserts and electrodes may be temperature controlled to control process conditions. RF discharge may be pulsed or modulated by different frequency in order to stimulate energy exchange between gas plasma and process material. The apparatuses may be grounded, biased and mechanically activated (e.g., vibration, rotation, etc.).

公开(公告)号：US10420199B2

公开(公告)日：2019-09-17

申请号：US15019313

申请日：2016-02-09

申请人： Applied Quantum Engeries, LLC

发明人： Benjamin Wolfe ,  George Paskalov ,  Rick Jarvis ,  Jerzy P. Puchacz

IPC分类号： A01C1/02 ,  H05H1/24 ,  B08B7/00 ,  A01C1/08 ,  A61L2/14 ,  H05H1/46

摘要： Methods and apparatuses to activate, modify, and sanitize the surfaces of granular, powdered, or seed material placed in a continuous flow of a low-temperature, reduced-pressure gas plasma. Said plasma may be created with radio-frequency power, using capacitive-inductive, or a combination of both types of discharge. The plasma is generated at pressures in the 0.01 to 10 Torr range. RF frequency ranges from 0.2 to 220 MHz, and correspond to a plasma density between about ne×108−ne×1012 or 0.001 to 0.4 W/cm3. Inserts and electrodes may be temperature controlled to control process conditions. RF discharge may be pulsed or modulated by different frequency in order to stimulate energy exchange between gas plasma and process material. The apparatuses may be grounded, biased and mechanically activated (e.g., vibration, rotation, etc.).