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公开(公告)号：US20170207069A1
公开(公告)日：2017-07-20
申请号：US15397883
申请日：2017-01-04
Applicant: Applied Materials, Inc.
Inventor： Sidharth BHATIA , Zhili ZUO , Hidehiro KOJIRI , Anjana M. PATEL , Song-Moon SUH , Ganesh BALASUBRAMANIAN
Abstract: A method of cleaning a remote plasma source includes supplying a first cycle of one or more first cleaning gases to a remote plasma source. The method includes supplying a second cycle of one or more second cleaning gases to the remote plasma source. The method includes supplying one or more cooling fluids to one or more cooling conduits coupled with the remote plasma source.
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