公开(公告)号：US20240071792A1

公开(公告)日：2024-02-29

申请号：US17895952

申请日：2022-08-25

Applicant: Applied Materials, Inc.

Inventor： Tapashree Roy ,  Todd Egan ,  Viswanath Bavigadda ,  Nitin Gupta

IPC: H01L21/67 ,  G06K9/62 ,  G06N20/00 ,  H01L21/677

CPC classification number: H01L21/67253 ,  G06K9/6256 ,  G06N20/00 ,  H01L21/67742

Abstract: A method includes receiving, by a processing device, first data generated by a first sensor of a substrate processing system. The first data is generated responsive to the first sensor receiving electromagnetic radiation from a substrate held by a robot arm of a transfer chamber in the substrate processing system. The method further includes processing the first data to obtain second data. The second data includes a first indication of performance of the substrate processing system. The method further includes causing, in view of the second data, performance of a corrective actions associated with the substrate processing system.