GAS DIFFUSION SHOWER HEAD DESIGN FOR LARGE AREA PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
    1.
    发明申请
    GAS DIFFUSION SHOWER HEAD DESIGN FOR LARGE AREA PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 审中-公开
    气体扩散淋浴头设计用于大面积等离子体增强化学蒸气沉积

    公开(公告)号:US20140230730A1

    公开(公告)日:2014-08-21

    申请号:US14261117

    申请日:2014-04-24

    Abstract: Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. At least one of the gas passages has a cylindrical shape for a portion of its length extending from the upstream side and a coaxial conical shape for the remainder length of the diffuser plate, the upstream end of the conical portion having substantially the same diameter as the cylindrical portion and the downstream end of the conical portion having a larger diameter.

    Abstract translation: 提供了用于在处理室中分配气体的气体分配板的实施例。 在一个实施例中,气体分配板包括具有上游侧和下游侧的扩散板和通过扩散板的上游侧和下游侧之间的多个气体通道。 气体通道中的至少一个具有从上游侧延伸的长度的一部分的圆柱形形状和扩散板的剩余长度的同轴圆锥形形状,锥形部分的上游端具有与 圆柱形部分和锥形部分的下游端具有较大的直径。

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