公开(公告)号：US20200066495A1

公开(公告)日：2020-02-27

申请号：US16415723

申请日：2019-05-17

Applicant: Applied Materials, Inc.

Inventor： Hamid NOORBAKHSH ,  Anwar HUSAIN ,  Reyn WAKABAYASHI

IPC: H01J37/32 ,  H01L21/683 ,  H01L21/687

Abstract: The present disclosure generally relates to apparatuses and methods for controlling a plasma sheath near a substrate edge. The apparatus relates to a processing chamber and/or a substrate support that includes an edge ring assembly with an edge ring electrode and an electrostatic chuck with a chucking electrode. The edge ring assembly is positioned adjacent the electrostatic chuck, such as with the edge ring assembly positioned exterior to or about the electrostatic chuck. The edge ring assembly includes a base and a cap positioned above the base with the edge ring electrode positioned between the cap and the base. The base of the edge ring electrode may include an inner recess and/or an outer recess with the cap including one or more lips that extend into the inner recess and/or the outer recess. One or more silicon rings and/or insulating rings are positioned adjacent the edge ring assembly.

公开(公告)号：US20210043428A1

公开(公告)日：2021-02-11

申请号：US17077871

申请日：2020-10-22

Applicant: Applied Materials, Inc.

Inventor： Hamid NOORBAKHSH ,  Anwar HUSAIN ,  Reyn WAKABAYASHI

IPC: H01J37/32 ,  H01L21/683 ,  H01L21/687

Abstract: The present disclosure generally relates to apparatuses and methods for controlling a plasma sheath near a substrate edge. The apparatus relates to a processing chamber and/or a substrate support that includes an edge ring assembly with an edge ring electrode and an electrostatic chuck with a chucking electrode. The edge ring assembly is positioned adjacent the electrostatic chuck, such as with the edge ring assembly positioned exterior to or about the electrostatic chuck. The edge ring assembly includes a base and a cap positioned above the base with the edge ring electrode positioned between the cap and the base. The base of the edge ring electrode may include an inner recess and/or an outer recess with the cap including one or more lips that extend into the inner recess and/or the outer recess. One or more silicon rings and/or insulating rings are positioned adjacent the edge ring assembly.