公开(公告)号：US20210222288A1

公开(公告)日：2021-07-22

申请号：US16308365

申请日：2017-11-28

Applicant: Applied Materials, Inc.

Inventor： Christof KURTHEN ,  Stefan HEIN ,  Reiner KUKLA ,  Neil MORRISON ,  Thomas DEPPISCH ,  Stefan LORENZ ,  Edgar HABERKORN

IPC: C23C14/34 ,  C23C14/06 ,  C23C14/50 ,  C23C14/58 ,  C23C14/56

Abstract: A deposition apparatus for coating a flexible substrate is described. The deposition apparatus comprises a first spool chamber housing a storage spool for providing the flexible substrate, a deposition chamber arranged downstream from the first spool chamber, and a second spool chamber arranged downstream from the deposition chamber and housing a wind-up spool for winding the flexible substrate thereon after deposition. The deposition chamber comprises a coating drum for guiding the flexible substrate past a plurality of deposition units including at least one deposition unit having a graphite target. The coating drum is connected to a device for applying an electrical potential to the coating drum.

公开(公告)号：US20200318233A1

公开(公告)日：2020-10-08

申请号：US16308695

申请日：2017-11-28

Applicant: Edgar HABERKORN ,  Stefan LORENZ ,  Stefan HEIN ,  Neil MORRISON ,  Reiner KUKLA ,  Christof KURTHEN ,  Thomas DEPPISCH ,  Applied Materials, Inc.

Inventor： Edgar HABERKORN ,  Stefan LORENZ ,  Stefan HEIN ,  Neil MORRISON ,  Reiner KUKLA ,  Christof KURTHEN ,  Thomas DEPPISCH

IPC: C23C14/58 ,  C23C14/06 ,  C23C14/50 ,  C23C14/34

Abstract: A deposition apparatus for coating a flexible substrate is described. The deposition apparatus includes a first spool chamber housing a storage spool for providing the flexible substrate, a deposition chamber arranged downstream from the first spool chamber, and a second spool chamber arranged downstream from the deposition chamber and housing a wind-up spool for winding the flexible substrate thereon after deposition. The deposition chamber includes a coating drum for guiding the flexible substrate past a plurality of deposition units including at least one deposition unit having a graphite target. Further, the deposition chamber includes a coating treatment device configured to densify a layer deposited on the flexible substrate.