V-shape seal band for a semiconductor processing chamber

    公开(公告)号:US20210183680A1

    公开(公告)日:2021-06-17

    申请号:US17184454

    申请日:2021-02-24

    Abstract: Implementations described herein provide a substrate support assembly that includes a seal band. The seal band has a ring shaped body. The ring shaped body has an inner surface, a top surface, and a bottom surface. Each of the top surface and the bottom surface extend from the inner surface at a first angle of more than 110° from the inner surface. The seal band also has an outer surface that has an indent formed therein. The outer surface connects the top surface to the bottom surface. A second angle is formed between an imaginary line normal to the inner surface and the bottom surface. The second angle is between about 10° and about 30°. The ring shaped body has a cross-sectional profile forming a V-shape.

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