公开(公告)号：US20140263173A1

公开(公告)日：2014-09-18

申请号：US14201737

申请日：2014-03-07

Applicant: Applied Materials, Inc.

Inventor： Craig ROSSLEE ,  Srinivas D. NEMANI ,  Dmitry LUBOMIRSKY ,  Ellie Y. YIEH

IPC: B05D3/06 ,  H01J37/30

CPC classification number: H01J37/3007 ,  C23C16/26 ,  C23C16/56 ,  H01J37/32422 ,  H01L21/02115 ,  H01L21/02274 ,  H01L21/02351 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/31122

Abstract: Methods for using an electron beam treatment performed on an amorphous carbon layer to form a treated amorphous carbon layer with high etching resistance are provided. In one embodiment, a method of treating an amorphous carbon film includes providing a substrate having a material layer disposed, forming an amorphous carbon layer on the material layer, and performing an electron beam treatment process on the amorphous carbon layer.

Abstract translation: 提供了使用对无定形碳层进行电子束处理以形成具有高耐蚀刻性的处理的无定形碳层的方法。 在一个实施方案中，一种处理非晶碳膜的方法包括提供具有设置的材料层的基底，在该材料层上形成无定形碳层，并对非晶碳层进行电子束处理。