CHAMBER MATCHING AND CALIBRATION
    1.
    发明申请

    公开(公告)号:US20220005713A1

    公开(公告)日:2022-01-06

    申请号:US16921741

    申请日:2020-07-06

    IPC分类号: H01L21/67 G06N3/08 H05B1/02

    摘要: A method includes receiving a plurality of sets of sensor data associated with a processing chamber of a substrate processing system. Each of the plurality of sets of sensor data comprises a corresponding sensor value of the processing chamber mapped to a corresponding spacing value of the processing chamber. The method further includes providing the plurality of sets of sensor data as input to a trained machine learning model. The method further includes obtaining, from the trained machine learning model, one or more outputs indicative of a health of the processing chamber. The method further includes causing, based on the one or more outputs, performance of one or more corrective actions associated with the processing chamber.

    Chamber matching and calibration
    2.
    发明授权

    公开(公告)号:US11749543B2

    公开(公告)日:2023-09-05

    申请号:US16921741

    申请日:2020-07-06

    IPC分类号: H01L21/67 H05B1/02 G06N3/08

    摘要: A method includes receiving a plurality of sets of sensor data associated with a processing chamber of a substrate processing system. Each of the plurality of sets of sensor data comprises a corresponding sensor value of the processing chamber mapped to a corresponding spacing value of the processing chamber. The method further includes providing the plurality of sets of sensor data as input to a trained machine learning model. The method further includes obtaining, from the trained machine learning model, one or more outputs indicative of a health of the processing chamber. The method further includes causing, based on the one or more outputs, performance of one or more corrective actions associated with the processing chamber.