公开(公告)号：US10048163B1

公开(公告)日：2018-08-14

申请号：US15352624

申请日：2016-11-16

Applicant: APPLE INC.

Inventor： Alon Yasovsky ,  Benny Pesach

IPC: G02B27/44 ,  G01M11/02 ,  G02B5/18 ,  G01N21/47

Abstract: Optical apparatus includes a diffractive optical element (DOE), which includes multiple optical surfaces, including at least an entrance surface and an exit surface, and a side surface, which is not parallel to the optical surfaces of the DOE. A grating is formed on at least one of the optical surfaces so as to receive radiation entering the DOE via the entrance surface and to diffract the radiation into a predefined pattern comprising multiple diffraction orders that exit the DOE via the exit surface. An optical detector is positioned in proximity to the side surface so as to receive and sense an intensity of a high order of the radiation diffracted from the grating that passes through the side surface of the DOE.

公开(公告)号：US10823635B1

公开(公告)日：2020-11-03

申请号：US16035642

申请日：2018-07-15

Applicant: APPLE INC.

Inventor： Alon Yasovsky ,  Benny Pesach

IPC: G01M11/00 ,  G01N21/00 ,  G01M11/02 ,  G02B5/18 ,  G01N21/47 ,  G02B27/42

Abstract: Optical apparatus includes a diffractive optical element (DOE), which includes multiple optical surfaces, including at least an entrance surface and an exit surface, and a side surface, which is not parallel to the optical surfaces of the DOE. A grating is formed on at least one of the optical surfaces so as to receive radiation entering the DOE via the entrance surface and to diffract the radiation into a predefined pattern comprising multiple diffraction orders that exit the DOE via the exit surface. An optical detector is positioned in proximity to the side surface so as to receive and sense an intensity of a high order of the radiation diffracted from the grating that passes through the side surface of the DOE.

公开(公告)号：US11054664B2

公开(公告)日：2021-07-06

申请号：US14742816

申请日：2015-06-18

Applicant: APPLE INC.

Inventor： Alon Yasovsky ,  Ronen Deitch ,  Yohai Zmora

IPC: H04N7/18 ,  G02B27/42 ,  G06K9/00

Abstract: A method for projection includes projecting a pattern of structured light with a given average intensity onto a scene. A sequence of images is captured of the scene while projecting the pattern. At least one captured image in the sequence is processed in order to extract a depth map of the scene. A condition is identified in the depth map indicative of a fault in projection of the pattern. Responsively to the identified condition, the average intensity of the projection of the pattern is reduced.

公开(公告)号：US09528906B1

公开(公告)日：2016-12-27

申请号：US14548476

申请日：2014-11-20

Applicant: Apple Inc.

Inventor： Alon Yasovsky ,  Benny Pesach

IPC: G02B27/44 ,  G01M11/02 ,  G01J1/04 ,  G02B27/42

CPC classification number: G01M11/0207 ,  G01N21/4788 ,  G02B5/18 ,  G02B27/4205 ,  G02B2005/1804

Abstract: Optical apparatus includes a diffractive optical element (DOE), which includes multiple optical surfaces, including at least an entrance surface and an exit surface, and a side surface, which is not parallel to the optical surfaces of the DOE. A grating is formed on at least one of the optical surfaces so as to receive radiation entering the DOE via the entrance surface and to diffract the radiation into a predefined pattern comprising multiple diffraction orders that exit the DOE via the exit surface. An optical detector is positioned in proximity to the side surface so as to receive and sense an intensity of a high order of the radiation diffracted from the grating that passes through the side surface of the DOE.

Abstract translation: 光学装置包括衍射光学元件（DOE），其包括至少包括入射表面和出射表面的多个光学表面和不平行于DOE的光学表面的侧表面。 在至少一个光学表面上形成光栅以便经由入射表面接收进入DOE的辐射，并将辐射衍射成包括经由出射表面离开DOE的多个衍射级的预定图案。 光学检测器位于侧表面附近，以便接收和感测通过DOE的侧表面的光栅衍射的高阶辐射的强度。

公开(公告)号：US20160371845A1

公开(公告)日：2016-12-22

申请号：US14742816

申请日：2015-06-18

Applicant: APPLE INC.

Inventor： Alon Yasovsky ,  Ronen Deitch ,  Yohai Zmora

IPC: G06T7/00 ,  G06K9/46 ,  G06K9/52 ,  G02B27/42

CPC classification number: G02B27/4205 ,  G06K9/00335

Abstract: A method for projection includes projecting a pattern of structured light with a given average intensity onto a scene. A sequence of images is captured of the scene while projecting the pattern. At least one captured image in the sequence is processed in order to extract a depth map of the scene. A condition is identified in the depth map indicative of a fault in projection of the pattern. Responsively to the identified condition, the average intensity of the projection of the pattern is reduced.

Abstract translation: 一种用于投影的方法包括将具有给定平均强度的结构光的图案投影到场景上。 在投影图案时捕获场景序列。 处理序列中的至少一个拍摄图像以便提取场景的深度图。 在深度图中识别表示图案的投影中的故障的条件。 响应于识别的条件，图案的投影的平均强度降低。