公开(公告)号：US20240005146A1

公开(公告)日：2024-01-04

申请号：US17855085

申请日：2022-06-30

Applicant: Adobe Inc. ,  Delhi Technological University

Inventor： Tanay Anand ,  Piyush Gupta ,  Pinkesh Badjatiya ,  Nikaash Puri ,  Jayakumar Subramanian ,  Balaji Krishnamurthy ,  Chirag Singla ,  Rachit Bansal ,  Anil Singh Parihar

IPC: G06N3/08 ,  G06N3/04

CPC classification number: G06N3/08 ,  G06N3/0445

Abstract: In some embodiments, techniques for extracting high-value sequential patterns are provided. For example, a process may involve training a machine learning model to learn a state-action map that contains high-utility sequential patterns; extracting at least one high-utility sequential pattern from the trained machine learning model; and causing a user interface of a computing environment to be modified based on information from the at least one high-utility sequential pattern.