公开(公告)号：US20170330725A1

公开(公告)日：2017-11-16

申请号：US15592857

申请日：2017-05-11

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： NEIL K. COLVIN ,  TSEH-JEN HSIEH ,  PAUL B. SILVERSTEIN

IPC: H01J37/30 ,  H01J37/317

CPC classification number: H01J37/3002 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/061

Abstract: An ion implantation system is provided having one or more conductive components comprised of one or more of lanthanated tungsten and a refractory metal alloyed with a predetermined percentage of a rare earth metal. The conductive component may be a component of an ion source, such as one or more of a cathode, cathode shield, a repeller, a liner, an aperture plate, an arc chamber body, and a strike plate. The aperture plate may be associated with one or more of an extraction aperture, a suppression aperture and a ground aperture.